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Inventor: Katz; Dan
Address: Beverly Hills, CA
No. of patents: 2
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 5429070 |
High density plasma deposition and etching apparatus |
July 4, 1995 |
| Plasma deposition or etching apparatus is provided which comprises a plasma source located above and in axial relationship to a substrate process chamber. The plasma source may include a sapphire or alumina source tube for use with plasmas containing fluorine. Surrounding the plasma sour |
| 5421891 |
High density plasma deposition and etching apparatus |
June 6, 1995 |
| Plasma deposition or etching apparatus is provided which comprises a plasma source located above and in axial relationship to a substrate process chamber. Surrounding the plasma source are an inner magnetic coil and an outer magnetic coil arranged in the same plane perpendicular to the a |
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