Resources Contact Us Home
Kasuya; Yoshikazu
Sakutu, JP
No. of patents:

Patent Number Title Of Patent Date Issued
6784078 Methods for manufacturing semiconductor devices and semiconductor devices August 31, 2004
Semiconductor devices and methods for manufacturing the same in which deterioration of the electrical characteristic is suppressed are described. One method for manufacturing a semiconductor device includes the steps of: forming a first polysilicon layer 32 on a gate dielectric layer
6528414 Methods for forming wiring line structures in semiconductor devices March 4, 2003
Embodiments include a manufacturing method for a semiconductor device which can suppress a concave from being generated in an upper area of a wiring layer at a position above plug. The method may include the steps of (a) forming an impurity diffusion layer 34; (b) forming, on the impurit

  Recently Added Patents
Location-type tagging using collected traveler data
Clostridium chauvoei polypeptide, DNA encoding the polypeptide and a vaccine comprising the polypeptide
Semiconductor chip, stack module, and memory card
Belt with light
Basket for a dishwasher
System and method for providing private demand-driven pricing
Use of LPA for encouraging pregnancy, and fertility agent
  Randomly Featured Patents
Method of immunossay including deactivation of endogenous alkaline phosphatase
Door opening device for wheelchair-bound persons
Beverage barrel bladder system and apparatus
Computer or similar article
Alumoxane-enhanced, supported Ziegler-Natta catalysts, methods of making same, processes of using same and polymers produced therefrom
Unitary guitar construction
Partitioning wall
Adhesive composition and optical member using the same
Metro Ethernet connectivity fault management acceleration
Synchronous validation and acknowledgment of electronic data interchange (EDI)