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Kasuya; Yoshikazu
Sakutu, JP
No. of patents:

Patent Number Title Of Patent Date Issued
6784078 Methods for manufacturing semiconductor devices and semiconductor devices August 31, 2004
Semiconductor devices and methods for manufacturing the same in which deterioration of the electrical characteristic is suppressed are described. One method for manufacturing a semiconductor device includes the steps of: forming a first polysilicon layer 32 on a gate dielectric layer
6528414 Methods for forming wiring line structures in semiconductor devices March 4, 2003
Embodiments include a manufacturing method for a semiconductor device which can suppress a concave from being generated in an upper area of a wiring layer at a position above plug. The method may include the steps of (a) forming an impurity diffusion layer 34; (b) forming, on the impurit

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