| Patent Number |
Title Of Patent |
Date Issued |
| 7623237 |
Sample investigating system |
November 24, 2009 |
| A spectroscopic system for adjusting spacing between an adjacent source/detector as a unit, and a sample, and a reflecting means for directing an incident beam which reflects from said sample back onto said sample and then into the detector along a locus which is in a plane of incide |
| 7616319 |
Spectroscopic ellipsometer and polarimeter systems |
November 10, 2009 |
| A rotating compensator spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of |
| 7554662 |
Spatial filter means comprising an aperture with a non-unity aspect ratio in a system for invest |
June 30, 2009 |
| Systems which utilize electromagnetic radiation to investigate samples and include at least one spatial filter which has an aperture having a hole therethrough with a non-unity aspect ratio. |
| 7535566 |
Beam chromatic shifting and directing means |
May 19, 2009 |
| An electromagnetic beam chromatic shifting and directing means for use in reflectively directing a spectroscopic beam of electromagnetic radiation while simultaneously de-emphasizing intensity in a first range of wavelengths, (eg. the Visible wavelengths), and simultaneously relatively |
| 7522279 |
System for and method of investigating the exact same point on a sample substrate with multiple |
April 21, 2009 |
| Disclosed are system for and method of analyzing the substantially the exact same point on a sample system with at least two wavelengths, or at least two ranges of wavelengths for which the focal lengths do not vary more than within an acceptable amount. |
| 7508510 |
System for and method of investigating the exact same point on a sample substrate with multiple |
March 24, 2009 |
| System for and Method of analyzing a sample at substantially the exact same small spot thereon with a plurality of wavelengths using a lens system which provides the same focal length at at least two wavelengths at various positions thereof with respect to a sample, including analyzi |
| 7505134 |
Automated ellipsometer and the like systems |
March 17, 2009 |
| Systems and methodology for orienting the tip/tilt and vertical height of samples, preferably automated, as applied in ellipsometer and the like systems. |
| 7492455 |
Discrete polarization state spectroscopic ellipsometer system and method of use |
February 17, 2009 |
| A spectroscopic ellipsometer system comprising a plurality of individual sources which are sequentially energized to provide a sequence of beams, each of different polarization state but directed along a common locus toward a sample. The preferred spectroscopic ellipsometer system has no |
| 7483148 |
Ellipsometric investigation of very thin films |
January 27, 2009 |
| Use of spectroscopic data obtained by investigation of a witness sample having a relatively thick dielectric on a surface thereof during deposition of a thin film onto the witness sample and onto a process sample having no, or a relatively thin dielectric on its surface, in character |
| 7468794 |
Rotating compensator ellipsometer system with spatial filter equivalent |
December 23, 2008 |
| Application of a spatial filter equivalent constructed from a converging lens and an optical fiber in rotating compensator ellipsometer systems, after a sample system. The purpose is to eliminate a radially outer annulus of a generally arbitrary Profile beam that presents with low in |
| 7460230 |
Deviation angle self compensating substantially achromatic retarder |
December 2, 2008 |
| A substantially achromatic multiple element compensator system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems. Multiple total internal reflections enter retardance into an entered beam of electromag |
| 7450231 |
Deviation angle self compensating substantially achromatic retarder |
November 11, 2008 |
| A substantially achromatic multiple element compensator system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems. Multiple total internal reflections enter retardance into an entered beam of electromag |
| 7385697 |
Sample analysis methodology utilizing electromagnetic radiation |
June 10, 2008 |
| Simultaneous use of wavelengths in at least two ranges selected from RADIO, MICRO, FIR, IR, NIR-VIS-NUV, UV, DUV, VUV EUV, XRAY in a regression procedure to evaluate parameters in mathematical dispersion structures to model dielectric functions. |
| 7362435 |
Method of determining initial thickness value for sample surface layer, and use of splines for f |
April 22, 2008 |
| A method of determining a starting value for thickness of the most influential layer in a mathematical model of a sample for use in a data fitting routine, supplemented by the use of ordinary or B-spline polynomials to represent at least one of the real and imaginary parts of optical |
| 7349092 |
System for reducing stress induced effects during determination of fluid optical constants |
March 25, 2008 |
| A system for determination of optical constants of liquids, including provision for reducing stress induced effects while obtaining data. |
| 7345762 |
Control of beam spot size in ellipsometer and the like systems |
March 18, 2008 |
| Disclosed are system for and method of analyzing substantially the exact same spot size on a sample system with at least two wavelengths for which the focal lengths do not vary more than within an acceptable amount. |
| 7336361 |
Spectroscopic ellipsometer and polarimeter systems |
February 26, 2008 |
| A spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of detector elements, |
| 7327456 |
Spectrophotometer, ellipsometer, polarimeter and the like systems |
February 5, 2008 |
| Disclosed are improvements in ellipsometer and the like systems capable of operating in the Vacuum-Ultra-Violet (VUV) to Near Infrared (NIR) wavelength range, and methodology of use. |
| 7317529 |
Aspects of producing, directing, conditioning, impinging and detecting spectroscopic electromagn |
January 8, 2008 |
| Systems and methods for providing and enhancing electromagnetic radiation beam radial energy homogeneity and intensity vs. wavelength content, for reliably directing electromagnetic radiation emitted by a source thereof in a common direction, for achromatically reducing spot size on a sa |
| 7307724 |
Method of reducing the effect of noise in determining the value of a dependent variable |
December 11, 2007 |
| A method of reducing the effect of systematic and/or random noise during determination of dependent variable values, (eg. pseudo "n" and "k" and/or ellipsometric PSI and DELTA or mathematical equivalent vs. wavelength or angle of incidence), involving selecting a mathematical functio |
| 7304737 |
Rotating or rotatable compensator system providing aberation corrected electromagnetic raadiatio |
December 4, 2007 |
| Spectroscopic ellipsometer systems which include polarizer and analyzer elements which remain fixed in position during data acquisition while at least one continuously rotating or step-wise rotatable compensator imposes a continuously variable or plurality of sequentially discrete po |
| 7301631 |
Control of uncertain angle of incidence of beam from Arc lamp |
November 27, 2007 |
| A system for stabilizing the angle of incidence a beam of electromagnetic radiation from a vertically oriented Arc lamp onto a horizontally oriented sample surface. |
| 7295313 |
Application of intermediate wavelength band spectroscopic ellipsometry to in-situ real time fabr |
November 13, 2007 |
| Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data over an intermediate wavelength band range around a pass or rejec |
| 7283234 |
Use of ellipsometry and surface plasmon resonance in monitoring thin film deposition or removal |
October 16, 2007 |
| Improved methodology for monitoring deposition or removal of material to or from a process and/or wittness substrate which demonstrates a negative e1 at some wavelength. The method involves detection of changes in P-polarized electromagnetism ellipsometric DELTA at SPR Resonance Angl |
| 7277171 |
Flying mobile on-board ellipsometer, polarimeter, reflectometer and the like systems |
October 2, 2007 |
| A substantially self-contained "on-board" material system investigation system functionally mounted on a three dimensional locational system to enable positioning at desired locations on, and distances from, the surface of a large sample, including the capability to easily and conven |
| 7274450 |
Sample entry purge system in spectrophotometer, ellipsometer, polarimeter and the like systems |
September 25, 2007 |
| A sample sequestering system which allows access to a subspace in a chamber encompassed generally enclosed space, for use in entering and removing a sample when the subspace is opened to atmosphere. Sufficient purge gas is flowed from within the generally enclosed space into the subs |
| 7268876 |
General virtual interface algorithm for in-situ spectroscopic ellipsometric data analysis |
September 11, 2007 |
| A method of characterizing the outermost material on an article manufactured by deposition or removal of material from its surface, which requires no prior knowledge of the composition of the article. |
| 7265838 |
Method of calibrating effects of multi-AOI-system for easy changing angles-of-incidence in ellip |
September 4, 2007 |
| Disclosed is a system for enabling easy sequential setting of different Angles-of-Incidence of a beam of electromagnetic radiation to a surface of a sample system involving regression based methodology for evaluating and compensating the effects of the presence electromagnetic beam i |
| 7245376 |
Combined spatial filter and relay systems in rotating compensator ellipsometer/polarimeter |
July 17, 2007 |
| Low aberration relay systems modified to perform as spatial filters in rotating compensator ellipsometer, polarimeter and the like systems. |
| 7215424 |
Broadband ellipsometer or polarimeter system including at least one multiple element lens |
May 8, 2007 |
| Quasi-achromatic multi-element lens(es) which are precisely mounted with respect to one another in a tubular mounting fixture, and the application thereof in focusing, (and optionally re-colliminating), a spectroscopic electromagnetic beam into a very small, chromatically relatively |
| 7215423 |
Control of beam spot size in ellipsometer and the like systems |
May 8, 2007 |
| System and methodology for controlling a beam spot size where it impinges onto a sample, and/or discriminant selection and analysis of data from detector elements in a two dimensional detector array which correspond to identified regions on a sample. |
| 7193710 |
Rotating or rotatable compensator spectroscopic ellipsometer system including multiple element l |
March 20, 2007 |
| Disclosed are spectroscopic ellipsometer systems which include polarizer and analyzer elements which remain fixed in position during data acquisition, and at least one continuously rotating or step-wise rotatable compensator which transmits an electromagnetic beam therethrough and |
| 7193709 |
Ellipsometric investigation of thin films |
March 20, 2007 |
| Use of differences in spectroscopic spectra resulting from multiple sample investigation, or sequential investigation of the same sample in evaluation of sample characterizing parameters such as ultra-thin film thickness. |
| 7167241 |
Dielectric function of thin metal films determined by combined transmission spectroscopic ellips |
January 23, 2007 |
| Determination of thin metal film dielectric function and layer thicknesses using simultaneous transmission spectroscopic ellipsometric (SE) and transmission intensity (T) measurements obtained in-situ to break correlation between thickness and optical constants of very thin absorbing |
| 7158231 |
Spectroscopic ellipsometer and polarimeter systems |
January 2, 2007 |
| A spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of detector elements, |
| 7136172 |
System and method for setting and compensating errors in AOI and POI of a beam of EM radiation |
November 14, 2006 |
| System and methodology for setting, and compensating detected errors between intended and realized Angle-of-Incidence (AOI) and Plane-Of-Incidence (POI) settings in ellipsometer and the like systems during analysis of sample characterizing data. |
| 7099006 |
Ellipsometer or polarimeter and the like system with beam chromatic shifting and directing means |
August 29, 2006 |
| An electromagnetic beam chromatic shifting and directing means for use in reflectively directing a spectroscopic beam of electromagnetic radiation while de-emphasizing visual wavelength intensity and simultaneously emphasizing both IR and UV wavelength intensities, applied in ellipso |
| 7075650 |
Discrete polarization state spectroscopic ellipsometer system and method of use |
July 11, 2006 |
| A spectroscopic ellipsometer system comprising a plurality of individual sources which are sequentially energized to provide a sequence of beams, each of different polarization state but directed along a common locus toward a sample. The prefered spectroscopic ellipsometer system has no |
| 7075649 |
Discrete polarization state rotatable compensator spectroscopic ellipsometer system, and method |
July 11, 2006 |
| Disclosed are spectroscopic ellipsometer and combined spectroscopic reflectometer/ellipsometer systems. The spectroscopic ellipsometer system portion includes polarizer and analyzer elements which remain fixed in position during data acquisition, and a step-wise rotatable compensator |
| 7057717 |
System for and method of investigating the exact same point on a sample substrate with at least |
June 6, 2006 |
| Disclosed are system for and method of analyzing the substantially the exact same point on a sample system with at least two wavelengths, or at least two ranges of wavelengths for which the focal lengths do not vary more than within an acceptable amount. |
| 7025501 |
Tracking temperature change in birefringent materials |
April 11, 2006 |
| A method for tracking change in Temperature of Uniaxial or Biaxial Anisotropic Samples utilizing polarized electromagnetic radiation. |
| 6982792 |
Spectrophotometer, ellipsometer, polarimeter and the like systems |
January 3, 2006 |
| Disclosed are improvements in ellipsometer and the like systems capable of operating in the Vacuum-Ultra-Violet (VUV) to Near Infrared (NIR) wavelength range, and methodology of use. |
| 6950182 |
Functional equivalent to spatial filter in ellipsometer and the like systems |
September 27, 2005 |
| Disclosed is the application of a functional equivalent to a spatial filter in ellipsometer and the like systems. Included are demonstrated multi-element converging lens systems which focus an electromagnetic beam onto a fiber optic. The purpose is to eliminate a radially outer annulus |
| 6940595 |
Application of spectroscopic ellipsometry to in-situ real time fabrication of multiple layer alt |
September 6, 2005 |
| Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data to monitor and/or control fabrication of multiple layer high/low |
| 6937341 |
System and method enabling simultaneous investigation of sample with two beams of electromagneti |
August 30, 2005 |
| Disclosed are system and method for characterizing a system consisting of a fluid sample on a two sided stage, utilizing data obtained by applying, from both sides thereof, beams of electromagnetic radiation to a fluid coated surface in a containing cell volume. The beams can have the sa |
| 6930813 |
Spatial filter source beam conditioning in ellipsometer and the like systems |
August 16, 2005 |
| Disclosed is the application of spatial filters and beam energy homogenizing systems in ellipsometer and the like systems prior to a sample system. The purpose is to eliminate a radially outer annulus of a generally arbitrary intensity profile, so that electromagnetic beam intensity |
| 6859278 |
Multi-AOI-system for easy changing angles-of-incidence in ellipsometer, polarimeter and reflecto |
February 22, 2005 |
| Disclosed is a system for enabling easy sequential setting of different Angles-of-Incidence of a beam of electromagnetic radiation to a surface of a sample system, and to regression based methodology for evaluating and compensating the effects of the presence of electromagnetic beam |
| 6822738 |
Spectroscopic rotating compensator ellipsometer system with pseudo-achromatic retarder system |
November 23, 2004 |
| Disclosed is a spectroscopic Ellipsometer having pseudo-achromatic compensator(s) having fast axes which vary with wavelength and which provide, a range of retardations, (that is, maximum retardance minus minimum retardance), of less than 90 degrees over a range of wavelengths, said |
| 6804004 |
Multiple-element lens systems and methods for uncorrelated evaluation of parameters in parameter |
October 12, 2004 |
| Disclosed are multi-element lenses which demonstrate reduced achromatic focal length and reduced electromagentic beam spot size dispersal effects in ellipsometer and polarimeter systems. Also disclosed is methodology for evaluating parameters in parameterized equations which enables calc |
| 6795184 |
Odd bounce image rotation system in ellipsometer systems |
September 21, 2004 |
| Disclosed is an odd bounce image rotating system with a sequence of an odd number of reflecting elements, such that a polarized electromagnetic beam caused to enter, reflectively interacts with the odd number of reflecting elements and exits along an essentially non-deviated, non-displac |
