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Inventor: Johnston; Steven W.
Address: San Jose, CA
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 6596888 |
MOCVD of WNx thin films using imido precursors |
July 22, 2003 |
| Single imido tungsten imido precursors are described for the deposition of tungsten nitride on a substrate by processes such as metal organic chemical vapor deposition. The precursors may be employed to form diffusion barrier layers on microelectronic devices. A method for forming tu |
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