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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Jackson; David P.
Address:
Saugus, CA
No. of patents:
21
Patents:












Patent Number Title Of Patent Date Issued
8197603 Method and apparatus for treating a substrate with dense fluid and plasma June 12, 2012
The present invention is a method, process and apparatus for selective cleaning, drying, and modifying substrate surfaces and depositing thin films thereon using a dense phase gas solvent and admixtures within a first created supercritical fluid anti-solvent. Dense fluids are used in
8048830 Method of forming and using carbonated machining fluid November 1, 2011
A method of forming and delivering a carbonated machining fluid to be used in a machining process, the machining process including a tool contacting a substrate, comprises supplying a pressure vessel with a non-carbonated machining fluid and non-supercritical carbon dioxide. The mach
8021489 Substrate treatment process September 20, 2011
A method of forming a plasma to physicochemically modify properties of a fluid spray in a substrate treatment processes includes providing an applicator in proximity to the substrate. The applicator comprises an electrically insulated main body portion containing a cavity, a tube axi
7901540 Dense fluid delivery apparatus March 8, 2011
The present invention generally relates to a method and apparatus to produce and apply a variety of surface cleaning and modification spray treatments. More specifically, the present invention provides the simultaneous steps of selectively removing one or more unwanted surface contam
7601112 Dense fluid cleaning centrifugal phase shifting separation process and apparatus October 13, 2009
The present invention is an apparatus and process for cleaning substrates using fluids, including dense fluids. A perforated centrifuge drum operates within a pressure vessel. A dense fluid cleaning and management system including suitable process condition sensors provides for excha
7451941 Dense fluid spray cleaning process and apparatus November 18, 2008
Disclosed is a dense fluid spray cleaning apparatus comprising a gas supply (3) for providing a predetermined amount of a gas to an enhanced joule-thompson condensation reactor (2) and for providing gas to a propellant generator (4), a premix chamber (6) for receiving a solid particu
7389941 Nozzle device and method for forming cryogenic composite fluid spray June 24, 2008
The present invention includes a nozzle device and method for forming a composite fluid. The nozzle device generally comprises a nozzle portion connected to a main body. The main body includes an inner axial bore extending therethrough. An annular wall extends radially therefore and an
7293570 Carbon dioxide snow apparatus November 13, 2007
A carbon dioxide snow apparatus of the present invention includes a carbon dioxide snow generation system and a propellant generation system connected to a common carbon dioxide gas source. The carbon dioxide snow generation system includes a condenser having a at least two connected
7225819 Apparatus process and method for mounting and treating a substrate June 5, 2007
The present invention is a method, apparatus and process for an improved substrate mounting and processing technique for various substrate treatments comprising cleaning, dicing, sawing, polishing, and planarization, among others.
7219677 Method and apparatus for supercritical ozone treatment of a substrate May 22, 2007
Disclosed is a method and apparatus for treating a substrate with a reaction solvent formed of supercritical ozone in a feed phase. The feed phase can be aqueous, e.g., formed of heated, deionized water, nonaqueous, e.g., formed of a dense fluid, such as supercritical carbon dioxide,
7134946 Apparatus to treat and inspect a substrate November 14, 2006
An apparatus for treating a substrate with a cryogenic impingement fluid includes a protective enclosure defining an internal cavity, a cryogenic fluid applicator positioned within the internal cavity and a snow generation system connected to the cryogenic fluid applicator. The snow
6979362 Apparatus and process for the treatment, delivery and recycle of process fluids used in dense ph December 27, 2005
The present invention relates generally to providing an apparatus for on-site CO.sub.2 process fluids management. A standardized and universal platform is described which provides CO.sub.2 process fluids at various capacities, purity levels, pressures, temperatures and phases. Moreover,
6802961 Dense fluid cleaning centrifugal phase shifting separation process and apparatus October 12, 2004
The present invention is an apparatus and process for cleaning substrates using dense fluids under the influence of centrifugal force and dense fluid phase changes. A perforated centrifuge drum operates within a pressure vessel having drains and fill ports. System controls include a
6656017 Method and apparatus for creating an open cell micro-environment for treating a substrate with a December 2, 2003
The present invention is a method and apparatus for providing a low-cost and less complex micro-environment for treating a substrate using an impingement cryogenic or steam spray jet. A substrate and fixture is contained within an open-architecture prophylactic or cleaning cell where
5403621 Coating process using dense phase gas April 4, 1995
A process for coating a substrate with a chosen material comprising placing the substrate in a coating chamber and contacting the substrate with a mixture of the selected coating material in a chosen dense phase gas at a selected temperature and a pressure equal to or above the critical
5269850 Method of removing organic flux using peroxide composition December 14, 1993
A composition for removing organic contaminants, such a flux residues, from a solid substrate comprises: (a) hydrogen peroxide in the amount of about 3 to 5 percent by weight of the composition; (b) an alkaline compound in sufficient amount to provide a pH of at least 10.5 in the composi
5236602 Dense fluid photochemical process for liquid substrate treatment August 17, 1993
A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense
5215592 Dense fluid photochemical process for substrate treatment June 1, 1993
A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense
5196134 Peroxide composition for removing organic contaminants and method of using same March 23, 1993
A composition for removing organic contaminants, such a flux residues, from a solid substrate comprises: (a) hydrogen peroxide in the amount of about 3 to 5 percent by weight of the composition; (b) an alkaline compound in sufficient amount to provide a pH of at least 10.5 in the composi
5068040 Dense phase gas photochemical process for substrate treatment November 26, 1991
A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense
5013366 Cleaning process using phase shifting of dense phase gases May 7, 1991
A process for removing two or more contaminants from a substrate in a single process. The substrate to be cleaned is contacted with a dense phase gas at or above the critical pressure thereof. The phase of the dense phase gas is then shifted between the liquid state and the supercrit










 
 
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