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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Iyer; Anand N.
Address:
Santa Clara, CA
No. of patents:
5
Patents:




Patent Number Title Of Patent Date Issued
7601050 Polishing apparatus with grooved subpad October 13, 2009
A polishing apparatus is described. The polishing apparatus includes a rotatable platen, a drive mechanism to incrementally advance a polishing sheet having a polishing surface in a linear direction across the platen, a subpad on the platen to support the polishing sheet, the subpad havi
7553214 Polishing article with integrated window stripe June 30, 2009
A method is described. The method includes contacting a non-solid material to a non-linear edge of a sheet of polishing material, and causing the non-solid material to solidify to form a window that contacts the non-linear edge of the polishing material.
7429210 Materials for chemical mechanical polishing September 30, 2008
A polishing article and method for manufacturing a polishing article for use in a chemical mechanical polishing process is disclosed. The polishing article has a plurality of polishing material tiles separated by grooves formed in or through a polishing material and may be adhesively
7179159 Materials for chemical mechanical polishing February 20, 2007
A polishing article and method for manufacturing a polishing article for use in a chemical mechanical polishing process is disclosed. The polishing article has a plurality of polishing material tiles separated by grooves formed in or through a polishing material and may be adhesively
6811470 Methods and compositions for chemical mechanical polishing shallow trench isolation substrates November 2, 2004
Methods and compositions are provided for planarizing a substrate surface with reduced or minimal defects in surface topography. In one aspect, a method is provided for processing a substrate including positioning a substrate comprising at least first dielectric material and second d


 
 
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