Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Ichimura; Teruhiko
Address:
Kanagawa, JP
No. of patents:
2
Patents:












Patent Number Title Of Patent Date Issued
7163895 Polishing method January 16, 2007
The present invention is relates to a polishing method for polishing a semiconductor wafer (W) by pressing the semiconductor wafer (W) against a polishing surface (10) with use of a top ring (23) for holding the semiconductor wafer (W). A pressure chamber (70) is defined in the top r
5496749 Method of manufacturing thin film transistors in a liquid crystal display apparatus March 5, 1996
A first sheet of photomask is used when a gate electrode and a gate bus line are formed, a second sheet of photomask is used when patterning is applied to a semiconductor film which becomes an active layer of a transistor on the gate electrode, a third sheet of photomask is used when










 
 
  Recently Added Patents
Thin film transistor and flat panel display device including the same
AC/DC converter
Inductive signal transfer system for computing devices
RF amplifier with digital filter for polar transmitter
Surveillance apparatus and method for wireless mesh network
Active constant power supply apparatus
Far field telemetry operations between an external device and an implantable medical device during recharge of the implantable medical device via a proximity coupling
  Randomly Featured Patents
Flat heat exchanger tube
Semiconductor device with alternating conductivity type layer and method of manufacturing the same
Self-locking valve spring retainer
Process and device for cleaning the butts of worn anodes from an igneous electrolysis cell
Adjustable fastening device
Gold-palladium-nickel-copper-manganese filler metal for joining superalloy
Horizontal electric connector
High variable magnification wide angle zoom lens
Mechanism for preventing a winding slack of a roll paper
Inkjet printer for printing ink and fixative