Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Ichimura; Teruhiko
Address:
Kanagawa, JP
No. of patents:
2
Patents:












Patent Number Title Of Patent Date Issued
7163895 Polishing method January 16, 2007
The present invention is relates to a polishing method for polishing a semiconductor wafer (W) by pressing the semiconductor wafer (W) against a polishing surface (10) with use of a top ring (23) for holding the semiconductor wafer (W). A pressure chamber (70) is defined in the top r
5496749 Method of manufacturing thin film transistors in a liquid crystal display apparatus March 5, 1996
A first sheet of photomask is used when a gate electrode and a gate bus line are formed, a second sheet of photomask is used when patterning is applied to a semiconductor film which becomes an active layer of a transistor on the gate electrode, a third sheet of photomask is used when










 
 
  Recently Added Patents
Antenna array system
Agent for expelling parasites in humans, animals or birds
Communication system, authentication device, control server, communication method, and program
Techniques for data assignment from an external distributed file system to a database management system
Method for correcting integrating cavity effect for calibration and/or characterization targets
Methods and devices for rapid and specific detection of multiple proteins
Stacked structure and stacked method for three-dimensional chip
  Randomly Featured Patents
Method for automated document selection
System for measuring a physical variable
Membrane assembly, electrochemical cell, and electrolysis process using perfluorinated sandwich type membrane
Club divider of golf bag
Vehicle washing apparatus
Method and apparatus of opening and closing a bi-fold door
Image display apparatus, imaging apparatus, image display method, and program
Method and apparatus for wireless clock regeneration
Non-nucleoside reverse transcriptase inhibitors
Electronically simulated rotary-type cardfile