Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Ichimura; Teruhiko
Address:
Kanagawa, JP
No. of patents:
2
Patents:












Patent Number Title Of Patent Date Issued
7163895 Polishing method January 16, 2007
The present invention is relates to a polishing method for polishing a semiconductor wafer (W) by pressing the semiconductor wafer (W) against a polishing surface (10) with use of a top ring (23) for holding the semiconductor wafer (W). A pressure chamber (70) is defined in the top r
5496749 Method of manufacturing thin film transistors in a liquid crystal display apparatus March 5, 1996
A first sheet of photomask is used when a gate electrode and a gate bus line are formed, a second sheet of photomask is used when patterning is applied to a semiconductor film which becomes an active layer of a transistor on the gate electrode, a third sheet of photomask is used when










 
 
  Recently Added Patents
Systems, methods, and devices for selling transaction instruments via web-based tool
System and method for computational unification of heterogeneous implicit and explicit processing elements
Method for assembling a camera module, and camera module
Woven mesh substrate with semiconductor elements, and method and device for manufacturing the same
Modular connector for touch sensitive device
Apparatus and method for noise removal by spectral smoothing
Power saving methods for wireless systems
  Randomly Featured Patents
Electrolyte membranes and methods of use
Process for modifying the surface of polymer substrates by graft polymerization
Feed paper apparatus
Arrangement for exchanging supporting or driving rollers of a continuous casting plant
Aircraft seat
Complementary heterostructure integrated single metal transistor apparatus
Sampling frequency conversion apparatus and signal switching apparatus
Hybrid inflator
Apparatus for explosively welding a sleeve into a heat exchanger tube
Basket carrier blank