Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Ichimura; Teruhiko
Address:
Kanagawa, JP
No. of patents:
2
Patents:












Patent Number Title Of Patent Date Issued
7163895 Polishing method January 16, 2007
The present invention is relates to a polishing method for polishing a semiconductor wafer (W) by pressing the semiconductor wafer (W) against a polishing surface (10) with use of a top ring (23) for holding the semiconductor wafer (W). A pressure chamber (70) is defined in the top r
5496749 Method of manufacturing thin film transistors in a liquid crystal display apparatus March 5, 1996
A first sheet of photomask is used when a gate electrode and a gate bus line are formed, a second sheet of photomask is used when patterning is applied to a semiconductor film which becomes an active layer of a transistor on the gate electrode, a third sheet of photomask is used when










 
 
  Recently Added Patents
Filter arrangements; housing; assemblies; and, methods
Article of footwear with a removable foot-supporting insert
Apparatus for manufacturing aluminum nitride single crystal, method for manufacturing aluminum nitride single crystal, and aluminum nitride single crystal
Method to protect data on a disk drive from uncorrectable media errors
Fine grained Ni-based alloys for resistance to stress corrosion cracking and methods for their design
Charge suspend feature for a mobile device
Cell deterioration warning apparatus and method
  Randomly Featured Patents
Method and apparatus for detecting improper area for motion compensation in video signal
Mobile communication system and communication holding method
Domestic gas detection and expulsion appliance
Pulse-width modulation circuit and switching amplifier using the same
Data processor
Secure distribution of video on-demand
Folding play structure
Method and system for automatic link hang up
Ostomy bag filter with interactive surfaces
Mobile phone