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Inventor:
Hoose; John F.
Address:
Rochester, NY
No. of patents:
2
Patents:












Patent Number Title Of Patent Date Issued
4980896 X-ray lithography system December 25, 1990
An x-ray lithography system is disclosed in which x-rays are generated by directing a high energy laser beam against a metal target to form an x-ray emitting plasma. The x-rays from the plasma are then directed through a mask towards a resist covered wafer to cause a patterned exposure o
4734923 Lithographic system mask inspection device March 29, 1988
A device used to test the features of a mask used in a semiconductor lithographic machine. The device includes an array of charge couple devices and an array of pinholes positioned above the charge couple devices. The array of pinholes includes a small pinhole opening for each of the










 
 
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