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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Hawthorne; Jeffrey Alan
Address:
Decatur, GA
No. of patents:
12
Patents:












Patent Number Title Of Patent Date Issued
8275564 Patterned wafer inspection system using a non-vibrating contact potential difference sensor September 25, 2012
A method and system for inspecting a surface of a material having a repeating pattern of relative work function. The method and system processes sensor data to identify data characteristic of the repeating pattern, and the sensor data is then further processed to remove the data char
7900526 Defect classification utilizing data from a non-vibrating contact potential difference sensor March 8, 2011
A method and system for identifying and classifying non-uniformities on the surface of a semiconductor or in a semiconductor. The method and system involves scanning the wafer surface with a non-vibrating contact potential difference sensor to detect the locations of non-uniformities,
7659734 Semiconductor inspection system and apparatus utilizing a non-vibrating contact potential differ February 9, 2010
A method and system for identifying a defect or contamination on the surface of a semiconductor or in a semiconductor. The method and system involves providing a semiconductor with a surface, such as a semiconductor wafer, providing a non-vibrating contact potential difference sensor
7634365 Inspection system and apparatus December 15, 2009
A method and system for identifying a defect or contamination on a surface of a sample. The system operates by detecting changes in work function across a surface via both vCPD and nvCPD. It utilizes a non-vibrating contact potential difference (nvCPD) sensor for imaging work function
7379826 Semiconductor wafer inspection system May 27, 2008
A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential differ
7337076 Inspection system and apparatus February 26, 2008
A method and system for identifying a defect or contamination on a surface of a sample. The system operates by detecting changes in work function across a surface via both vCPD and nvCPD. It utilizes a non-vibrating contact potential difference (nvCPD) sensor for imaging work function
7308367 Wafer inspection system December 11, 2007
A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential differ
7152476 Measurement of motions of rotating shafts using non-vibrating contact potential difference senso December 26, 2006
An apparatus having a non-vibrating contact potential probe. The non-vibrating contact potential probe is capable of measuring the chemical and geometrical irregularities on a rotating shaft. The chemical and geometrical information can be used to determine various properties of the
7107158 Inspection system and apparatus September 12, 2006
A method and system for identifying a defect or contamination on a surface of a sample. The system operates by detecting changes in work function across a surface via both vCPD and nvCPD. It utilizes a non-vibrating contact potential difference (nvCPD) sensor for imaging work function
7103482 Inspection system and apparatus September 5, 2006
A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential differ
7092826 Semiconductor wafer inspection system August 15, 2006
A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential differ
6957154 Semiconductor wafer inspection system October 18, 2005
A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference










 
 
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