| Patent Number |
Title Of Patent |
Date Issued |
| 6552350 |
System and method for providing a lithographic light source for a semiconductor manufacturing pr |
April 22, 2003 |
| A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume. |
| 6437349 |
Fluid nozzle system and method in an emitted energy system for photolithography |
August 20, 2002 |
| An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle |
| 6353232 |
Holder assembly system and method in an emitted energy system for photolithography |
March 5, 2002 |
| An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing |
| 6190835 |
System and method for providing a lithographic light source for a semiconductor manufacturing pr |
February 20, 2001 |
| A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume. |
| 6180952 |
Holder assembly system and method in an emitted energy system for photolithography |
January 30, 2001 |
| An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing |
| 6133577 |
Method and apparatus for producing extreme ultra-violet light for use in photolithography |
October 17, 2000 |
| A method and apparatus for producing extreme ultra-violet light comprising a nozzle for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light therefrom, and a diffuser for capturi |
| 6105885 |
Fluid nozzle system and method in an emitted energy system for photolithography |
August 22, 2000 |
| An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle |
| 6065203 |
Method of manufacturing very small diameter deep passages |
May 23, 2000 |
| A method of fabricating very small diameter deep passages is provided. The method of fabricating very small diameter deep passages may include fabricating a recess (206) in a first side (202) of an article (200). An article passage (216) may be fabricated between a second side (204) of t |
