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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Gutowski; Robert M
Address:
Glen Oaks, NY
No. of patents:
8
Patents:












Patent Number Title Of Patent Date Issued
6552350 System and method for providing a lithographic light source for a semiconductor manufacturing pr April 22, 2003
A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.
6437349 Fluid nozzle system and method in an emitted energy system for photolithography August 20, 2002
An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle
6353232 Holder assembly system and method in an emitted energy system for photolithography March 5, 2002
An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing
6190835 System and method for providing a lithographic light source for a semiconductor manufacturing pr February 20, 2001
A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.
6180952 Holder assembly system and method in an emitted energy system for photolithography January 30, 2001
An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing
6133577 Method and apparatus for producing extreme ultra-violet light for use in photolithography October 17, 2000
A method and apparatus for producing extreme ultra-violet light comprising a nozzle for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light therefrom, and a diffuser for capturi
6105885 Fluid nozzle system and method in an emitted energy system for photolithography August 22, 2000
An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle
6065203 Method of manufacturing very small diameter deep passages May 23, 2000
A method of fabricating very small diameter deep passages is provided. The method of fabricating very small diameter deep passages may include fabricating a recess (206) in a first side (202) of an article (200). An article passage (216) may be fabricated between a second side (204) of t










 
 
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