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Furusawa; Yoshikazu
Nirasaki, JP
No. of patents:

Patent Number Title Of Patent Date Issued
7208428 Method and apparatus for treating article to be treated April 24, 2007
A thermal treatment apparatus 1 includes a reaction tube 2 for containing wafers 10 contaminated with organic substances having a heater 12 capable of heating the reaction tube; a first gas supply pipe 13 for carrying oxygen gas into the reaction tube 2; and a second gas supply pipe 14 f
7064084 Oxide film forming method June 20, 2006
To provide a method for the formation of oxide films to form with advantage a high-quality oxide film having excellent uniformity in film thickness and film quality over the entire wafer. The method for the formation of oxide films comprises: the pretreatment process of forming a pro

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