| Patent Number |
Title Of Patent |
Date Issued |
| D595282 |
Mobile phone |
June 30, 2009 |
|
| 7271957 |
Computer-generated hologram and its fabrication process, reflector using a computer-generated ho |
September 18, 2007 |
| The invention provides a computer-generated hologram which can be viewed in white at the desired viewing region and a reflective liquid crystal display using the same as a reflector. The computer-generated hologram H is designed to diffuse light having a given reference wavelength .l |
| 7054044 |
Computer-generated hologram and its fabrication process, reflector using a computer-generated ho |
May 30, 2006 |
| The invention provides a computer-generated hologram which can be viewed in white at the desired viewing region and a reflective liquid crystal display using the same as a reflector. The computer-generated hologram H is designed to diffuse light having a given reference wavelength .l |
| 6747769 |
Computer-generated hologram and its fabrication process, reflector using a computer-generated ho |
June 8, 2004 |
| The invention provides a computer-generated hologram which can be viewed in white at the desired viewing region and a reflective liquid crystal display using the same as a reflector. The computer-generated hologram H is designed to diffuse light having a given reference wavelength .l |
| 5688617 |
Phase shift layer-containing photomask, and its production and correction |
November 18, 1997 |
| The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps to reduce or limit the incidence of phase shifter pattern deficiencies or other defects and |
| 5614336 |
Phase shift layer-containing photomask, and its production and correction |
March 25, 1997 |
| The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps to reduce or limit the incidence of phase shifter pattern deficiencies or other defects and |
| 5380609 |
Method for fabricating photomasks having a phase shift layer comprising the use of a positive to |
January 10, 1995 |
| The invention relates to a method for forming a resist pattern for dry etching a phase shifter layer in which a phase shifter pattern portion and a portion for protecting the surface of a light-blocking pattern are formed by a single photolithographic step. A light-blocking patter 40 is |
