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Foster; Bernard
Elkton, MD
No. of patents:

Patent Number Title Of Patent Date Issued
6899602 Porous polyurethane polishing pads May 31, 2005
A porous polishing pad is useful for polishing semiconductor substrates. The porous polishing pad has a porous matrix formed from a coagulated polyurethane and a non-fibrous polishing layer. The non-fibrous polishing layer has a polishing surface with a pore count of at least 500 pores p
6830090 Polishing pad installation tool December 14, 2004
A polishing pad installation tool comprised of a base portion and at least one compressible layer in operative connection with the base portion. The compressible layer includes a plurality of apertures through an upper surface of the compressible layer. The tool further includes a plural
6390909 Disk for conditioning polishing pads May 21, 2002
A conditioning disk including a unitary thermoplastic polymer sheet material cut a unitary circular plate formed with gear teeth along its circular edge, and formed with block form protrusions that are impelled in a sweeping motion by rotation of the unitary plate as a planetary gear in

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