| Patent Number |
Title Of Patent |
Date Issued |
| 6899602 |
Porous polyurethane polishing pads |
May 31, 2005 |
| A porous polishing pad is useful for polishing semiconductor substrates. The porous polishing pad has a porous matrix formed from a coagulated polyurethane and a non-fibrous polishing layer. The non-fibrous polishing layer has a polishing surface with a pore count of at least 500 pores p |
| 6830090 |
Polishing pad installation tool |
December 14, 2004 |
| A polishing pad installation tool comprised of a base portion and at least one compressible layer in operative connection with the base portion. The compressible layer includes a plurality of apertures through an upper surface of the compressible layer. The tool further includes a plural |
| 6390909 |
Disk for conditioning polishing pads |
May 21, 2002 |
| A conditioning disk including a unitary thermoplastic polymer sheet material cut a unitary circular plate formed with gear teeth along its circular edge, and formed with block form protrusions that are impelled in a sweeping motion by rotation of the unitary plate as a planetary gear in |
