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Forsyth; James M.
Mecedon, NY
No. of patents:

Patent Number Title Of Patent Date Issued
4980896 X-ray lithography system December 25, 1990
An x-ray lithography system is disclosed in which x-rays are generated by directing a high energy laser beam against a metal target to form an x-ray emitting plasma. The x-rays from the plasma are then directed through a mask towards a resist covered wafer to cause a patterned exposure o

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