| Patent Number |
Title Of Patent |
Date Issued |
| 7604701 |
Method and apparatus for removing external components from a process chamber without compromisin |
October 20, 2009 |
| An access assembly for a process chamber, including a wall segment constructed and arranged to access the process chamber, a mounting assembly constructed and arranged to couple the wall segment to the process chamber, and a sealing plate mounted to the process chamber. The sealing p |
| 7582186 |
Method and apparatus for an improved focus ring in a plasma processing system |
September 1, 2009 |
| A focus ring configured to be coupled to a substrate holder comprises a first surface exposed to a process; a second surface, opposite the first surface, for coupling to an upper surface of the substrate holder; an inner radial edge for facing a periphery of a substrate; and an outer |
| 7552521 |
Method and apparatus for improved baffle plate |
June 30, 2009 |
| An apparatus related to plasma chambers used for processing semiconductor substrates and specifically to improvements in pumping baffle plates used in plasma sources. An apparatus and method for making a baffle plate assembly formed from a modified baffle plate blank wherein a variety of |
| 7461614 |
Method and apparatus for improved baffle plate |
December 9, 2008 |
| A baffle plate assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a baffle plate having one or more openings to permit the passage of gas there through, wherein the coupling of the baffle plate to the substrate holder facilitates auto-center |
| 7350476 |
Method and apparatus to determine consumable part condition |
April 1, 2008 |
| A system for monitoring a condition of a consumable component in a substrate processing system that includes a tapered plug having a first axis, a second axis that intersects the first axis, a top portion with first width, a bottom portion with a second width, and sidewalls joining s |
| 7347901 |
Thermally zoned substrate holder assembly |
March 25, 2008 |
| A thermally zoned substrate holder including a substantially cylindrical base having top and bottom surfaces configured to support a substrate. A plurality of temperature control elements are disposed within the base. An insulator thermally separates the temperature control elements. The |
| 7311784 |
Plasma processing device |
December 25, 2007 |
| This invention relates to a plasma processing system. A common problem in the manufacture of semiconductors is the maintenance of a constant fluid flow throughout the chamber in which the semiconductors are being etched. The focus ring described herein helps control fluid flow such that |
| 7296534 |
Hybrid ball-lock attachment apparatus |
November 20, 2007 |
| The present invention uses hybrid ball-lock devices as an alternate for threaded fasteners. Parts of the fastener exposed directly to the plasma act as a shield for the remaining pieces of the fastener or are used as a material to actually enhance plasma characteristics. The present |
| 7241397 |
Honeycomb optical window deposition shield and method for a plasma processing system |
July 10, 2007 |
| An optical window deposition shield including a backing plate having a through hole, and a honeycomb structure having a plurality of adjacent cells configured to allow optical viewing through the honeycomb structure. Each cell of the honeycomb structure has an aspect ratio of length |
| 7237666 |
Multi-position stop mechanism |
July 3, 2007 |
| A multi-stop mechanism for providing multiple stop positions between first and second objects that are movable into and out of contact with one another. The multi-stop mechanism of the present invention includes a housing which secures the multi stop mechanism to the first object and/or |
| 7235155 |
Method and apparatus for monitoring plasma conditions using a monitoring ring |
June 26, 2007 |
| A plasma processing system is provided that allows for monitoring a plasma processing system during plasma processing. The plasma processing system includes a processing chamber and a monitoring system for monitoring conditions of the processing chamber. By providing tools within a tool |
| 7186313 |
Plasma chamber wall segment temperature control |
March 6, 2007 |
| A device and method for controlling the temperature of a plasma chamber inside wall or other surfaces exposed to the plasma by a plurality of temperature control systems. A plasma process within the plasma chamber can be controlled by independently controlling the temperature of segm |
| 7166170 |
Cylinder-based plasma processing system |
January 23, 2007 |
| A method and system for reducing the cost of a vacuum processing system by utilizing separately fabricated parts for the walls and the tops and bottoms of chambers. Walls are formed from cylinders (e.g., aluminum tubing or rolled ring forgings), and plates are then hermetically sealed |
| 7163603 |
Plasma source assembly and method of manufacture |
January 16, 2007 |
| A plasma source assembly including an outer shield, a dielectric chamber wall, and a helical coil provided between the outer shield and the dielectric chamber wall. The plasma source assembly also includes a coil support assembly configured to facilitate repeatable performance of the |
| 7143887 |
Multi-position stop mechanism |
December 5, 2006 |
| A multi-stop mechanism for providing multiple stop positions between first and second objects that are movable into and out of contact with one another. The multi-stop mechanism of the present invention includes a housing which secures the multi stop mechanism to the first object and/or |
| 7110110 |
Sensing component used to monitor material buildup and material erosion of consumables by optica |
September 19, 2006 |
| A sensing device for sensing a condition of a plasma processing system component. The sensing device includes a main body configured to contain a material, an emitter contained in the main body and configured to emit light when exposed to a plasma, and a mating feature connected to the |
| 7088046 |
Integrated process tube and electrostatic shield, assembly thereof and manufacture thereof |
August 8, 2006 |
| A plasma reactor sub-assembly includes both an electrostatic shield and a process tube. Optionally, the electrostatic shield and the process tube are connected. Alternatively, they are configured to fit together without being physically connected. The sub-assembly may be manufactured usi |
| 7064812 |
Method of using a sensor gas to determine erosion level of consumable system components |
June 20, 2006 |
| A method and system are provided for monitoring erosion of system components in a plasma processing system. The system components contain a gas emitter that can release a sensor gas into a plasma process environment. The sensor gas can produce characteristic fluorescent light emissio |
| 7040032 |
Method and device for measuring whether a process kit part meets a prescribed tolerance |
May 9, 2006 |
| A go no-go gauge and method for verifying whether a process kit part used within a plasma chamber of a plasma processing tool has accumulated excessive wear or deposits. The gauge includes a component for verifying whether a dimension of a process kit part feature violates a prescribed |
| 7005842 |
Probe cartridge assembly and multi-probe assembly |
February 28, 2006 |
| A probe cartridge assembly and a multi-probe assembly (10) including a mounting plate having a plurality of the probe cartridge assemblies mounted on the mounting plate. The probe cartridge assembly generally includes a mounting member, a probe insulator (30), a probe (40), a ferrule |
| 7001482 |
Method and apparatus for improved focus ring |
February 21, 2006 |
| A focus ring assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a focus ring having one or more wear indicators for determining the lifetime of the focus ring, wherein the coupling of the focus ring to the substrate holder facilitates au |
| 6963043 |
Asymmetrical focus ring |
November 8, 2005 |
| An asymmetrical focus ring varies the flow-field, which aids in normalizing pressure gradients across the wafer being processed, thereby improving the process. Embodiments of the present invention utilize a focus ring that either (1) contains a pattern of through holes that enhances pump |
| 6962348 |
Sealing apparatus having a single groove |
November 8, 2005 |
| A sealing apparatus includes a sealing arrangement and a groove in a base. The sealing arrangement may comprise an o-ring and a grounding gasket where both the o-ring and the grounding gasket partially protrude in a longitudinal direction from the groove. Thus, the grounding gasket, whic |
| 6960887 |
Method and apparatus for tuning a plasma reactor chamber |
November 1, 2005 |
| A plasma reactor or vacuum processing apparatus is provided with an orifice plate assembly. The orifice plate assembly includes an upper plate and a lower plate. Each plate is configured with through holes. The upper and lower orifice plates are independently rotatable with respect to ea |
| 6942222 |
Seal for sealing and load bearing a process tube in a vacuum system |
September 13, 2005 |
| A seal for sealing and load bearing a process tube in a vacuum system including a seal member and a load bearing spacer provided in a seal cavity. The seal generally includes a seal cavity provided in a housing, where the seal cavity is configured opposite the process tube. At least |
| 6887341 |
Plasma processing apparatus for spatial control of dissociation and ionization |
May 3, 2005 |
| A plasma processing apparatus for spatial control of dissociation and ionization and a method for controlling the dissociation and ionization in the plasma. An aspect of the present invention provides a plasma processing apparatus for spatial control of dissociation and ionization in |
