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Inventor:
Ebbing; Peter
Address:
Los Altos, CA
No. of patents:
10
Patents:












Patent Number Title Of Patent Date Issued
5648847 Method and apparatus for normalizing a laser beam to a reflective surface July 15, 1997
In an etch monitor system, a method and apparatus for adjusting the angle of incidence to normal between a laser beam and a reflective surface, such as a silicon wafer, includes a rotatable mirror having a pinhole formed therethrough, the rotatable mirror moveably mounted to be positione
5337144 Etch rate monitor using collimated light and method of using same August 9, 1994
An etch rate monitor for use with semiconductor wafer etching processes includes a source of light of normal incidence to the wafer surface through a window in the etching chamber. In a first embodiment, a Fresnel or positive lens is used to collect some of the diffraction orders caused
5263518 Method and apparatus for reducing particulate generation caused by door or cover flexing on high November 23, 1993
An inner lid is attached to a vacuum chamber, covering an inner region of the vacuum chamber. An outer lid, also attached to the vacuum chamber, covers the inner lid, leaving a region between the inner lid and the outer lid. A gas conduit allows gas to flow between the inner region of th
5224581 Magnetic semiconductor wafers with handling apparatus and method July 6, 1993
A semiconductor wafer is provided with magnetic material about the periphery for magnetically clamping the wafer on a seating gasket at the processing station. The seating gasket is annular for peripherally supporting the wafer. An electro-magnet establishes a peripheral station magn
5219007 Method and apparatus for reducing particulate generation caused by door or cover flexing on high June 15, 1993
An inner lid is attached to a vacuum chamber, covering an inner region of the vacuum chamber. An outer lid, also attached to the vacuum chamber, covers the inner lid, leaving a region between the inner lid and the outer lid. A gas conduit allows gas to flow between the inner region of th
5151584 Method and apparatus for endpoint detection in a semiconductor wafer etching system September 29, 1992
A method for endpoint detection in a semiconductor wafer etching system characterized by the steps of: 1) scanning a semiconductor wafer with a narrowly focused laser beam; 2) analyzing a reflected portion of the beam to determine a preferred parking spot on a preferred flat area of the
5147828 Method of handling magnetic semiconductor wafers September 15, 1992
A semiconductor wafer is provided with magnetic material about the periphery for magnetically clamping the wafer on a seating gasket at the processing station. The seating gasket is annular for peripherally supporting the wafer. An electro-magnet establishes a peripheral station magn
5077464 Method and apparatus for endpoint detection in a semiconductor wafer etching system December 31, 1991
A method for focussing a radiant energy beam characterized by the steps of scanning a beam of radiant energy across a test pattern including areas of differing reflectivity, detecting the variance in a reflected portion of the scanned beam and adjusting the beam to minimize the variance.
4953982 Method and apparatus for endpoint detection in a semiconductor wafer etching system September 4, 1990
A method for endpoint detection in a semiconductor wafer etching system characterized by the steps of: (1) scanning a semiconductor wafer with a narrowly focussed laser beam; (2) analyzing a reflected portion of the beam to determine a preferred parking spot on a preferred flat area of t
4813840 Method of aligning wafers and device therefor March 21, 1989
A cassette of conventional form is loaded with a plurality of semiconductor wafers having indexing flats of the known type and placed over three parallel rollers rotatably secured to a frame. The three rollers include a center roller and two side rollers positioned only slightly higher t










 
 
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