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DeKraker; David
Burnsville, MN
No. of patents:

Patent Number Title Of Patent Date Issued
8142571 Process for treatment of semiconductor wafer using water vapor containing environment March 27, 2012
A process is provided for treating a semiconductor wafer at a target wafer temperature. This process includes the following steps: a) determining the target wafer temperature of the semiconductor wafer during a given wafer treatment process step; b) providing a treatment chamber h
7913706 Rinsing methodologies for barrier plate and venturi containment systems in tools used to process March 29, 2011
Tool for treating microelectronic workpieces with one or more treatment materials, including liquids, gases, fluidized solids, dispersions, combinations of these, and the like. The invention provides an approach for rapid, efficient rinsing of wetted surface(s), and is particularly a
7819984 Process for treatment of substrates with water vapor or steam October 26, 2010
A method of treating a substrate comprises, in one aspect, placing a substrate having material on a surface thereof in a treatment chamber; directing a stream of a liquid treatment composition to impinge the substrate surface; and directing a stream of water vapor to impinge the subs

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