Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Davis; Blake W.
Address:
Hollister, CA
No. of patents:
5
Patents:












Patent Number Title Of Patent Date Issued
8029971 Photopatternable dielectric materials for BEOL applications and methods for use October 4, 2011
Compositions, a method, and a photopatternable blend. The compositions include a blend of a first and a second polymer. The first polymer is a substituted silsesquioxane copolymer. The second polymer is a substituted silsesquioxane polymer. The second polymer is configured to undergo
7944055 Spin-on antireflective coating for integration of patternable dielectric materials and interconn May 17, 2011
The present invention provides a method of fabricating an interconnect structure in which a patternable low-k material replaces the need for utilizing a separate photoresist and a dielectric material. Specifically, this invention relates to a simplified method of fabricating single-d
7919225 Photopatternable dielectric materials for BEOL applications and methods for use April 5, 2011
A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coat
7867689 Method of use for photopatternable dielectric materials for BEOL applications January 11, 2011
A method. The method includes dip coating a film of a composition on a silicon wafer substrate. The composition includes a polymer blend of a first polymer and a second polymer. The first polymer is a substituted silsesquioxane copolymer. The second polymer is a polysilsesquioxane ha
7709370 Spin-on antireflective coating for integration of patternable dielectric materials and interconn May 4, 2010
The present invention provides a method of fabricating an interconnect structure in which a patternable low-k material replaces the need for utilizing a separate photoresist and a dielectric material. Specifically, this invention relates to a simplified method of fabricating single-d










 
 
  Recently Added Patents
Polysiloxane-modified polyhydroxy polyurethane resin, method for producing same, heat-sensitive recording material using the resin, imitation leather, thermoplastic polyolefin resin skin mater
Method for direct modulation of the spinothalamic tract
Method and apparatus for archiving and visualizing digital images
System for evaluating manufacturability of a casting design
Strawberry plant named `Mayflower`
GNSS signal processing methods and apparatus with tracking interruption
Pullulanase variants and uses thereof
  Randomly Featured Patents
Rapid prototyping method and radiation-curable composition for use therein
Joy stick switch
Method and apparatus for producing patterned effect on knitted fabric
Mobile terminal for performing a communication by using sub carriers
Evacuable container having one-way valve with filter element
Personalizeable display frames
Persistent caching directory level support
In-circuit programming architecture with processor and delegable flash controller
Position control apparatus for fine stages carried by a coarse stage on a high-precision scanning positioning system
Paper post-processing apparatus and image recording apparatus