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Inventor:
Davis; Blake W.
Address:
Hollister, CA
No. of patents:
5
Patents:












Patent Number Title Of Patent Date Issued
8029971 Photopatternable dielectric materials for BEOL applications and methods for use October 4, 2011
Compositions, a method, and a photopatternable blend. The compositions include a blend of a first and a second polymer. The first polymer is a substituted silsesquioxane copolymer. The second polymer is a substituted silsesquioxane polymer. The second polymer is configured to undergo
7944055 Spin-on antireflective coating for integration of patternable dielectric materials and interconn May 17, 2011
The present invention provides a method of fabricating an interconnect structure in which a patternable low-k material replaces the need for utilizing a separate photoresist and a dielectric material. Specifically, this invention relates to a simplified method of fabricating single-d
7919225 Photopatternable dielectric materials for BEOL applications and methods for use April 5, 2011
A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coat
7867689 Method of use for photopatternable dielectric materials for BEOL applications January 11, 2011
A method. The method includes dip coating a film of a composition on a silicon wafer substrate. The composition includes a polymer blend of a first polymer and a second polymer. The first polymer is a substituted silsesquioxane copolymer. The second polymer is a polysilsesquioxane ha
7709370 Spin-on antireflective coating for integration of patternable dielectric materials and interconn May 4, 2010
The present invention provides a method of fabricating an interconnect structure in which a patternable low-k material replaces the need for utilizing a separate photoresist and a dielectric material. Specifically, this invention relates to a simplified method of fabricating single-d










 
 
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