Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Davis; Blake W.
Address:
Hollister, CA
No. of patents:
5
Patents:












Patent Number Title Of Patent Date Issued
8029971 Photopatternable dielectric materials for BEOL applications and methods for use October 4, 2011
Compositions, a method, and a photopatternable blend. The compositions include a blend of a first and a second polymer. The first polymer is a substituted silsesquioxane copolymer. The second polymer is a substituted silsesquioxane polymer. The second polymer is configured to undergo
7944055 Spin-on antireflective coating for integration of patternable dielectric materials and interconn May 17, 2011
The present invention provides a method of fabricating an interconnect structure in which a patternable low-k material replaces the need for utilizing a separate photoresist and a dielectric material. Specifically, this invention relates to a simplified method of fabricating single-d
7919225 Photopatternable dielectric materials for BEOL applications and methods for use April 5, 2011
A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coat
7867689 Method of use for photopatternable dielectric materials for BEOL applications January 11, 2011
A method. The method includes dip coating a film of a composition on a silicon wafer substrate. The composition includes a polymer blend of a first polymer and a second polymer. The first polymer is a substituted silsesquioxane copolymer. The second polymer is a polysilsesquioxane ha
7709370 Spin-on antireflective coating for integration of patternable dielectric materials and interconn May 4, 2010
The present invention provides a method of fabricating an interconnect structure in which a patternable low-k material replaces the need for utilizing a separate photoresist and a dielectric material. Specifically, this invention relates to a simplified method of fabricating single-d










 
 
  Recently Added Patents
Reduced plating ignitron
Process information structuring support method
Minimizing mismatch during compensation
Reliable event broadcaster with multiplexing and bandwidth control functions
Satellite fleet deployment
Communication system including relay station and data frame for the communication system
Supporting multiple channels of a single interface
  Randomly Featured Patents
Post treated diamond coated body
Process cartridge and image forming apparatus
Process for the production of low fat meats
Semiconductor memory device provided with I/O clamp circuit
Assembly and method for cryo-preservation of specimens in a cryogen-free environment
Processes for the isomerization of normal butane to isobutane
Significance analysis of microarrays
Process of producing guanidinothiazole derivatives
Watch strap
Hemihydrate type phosphoric acid process