Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Cook; Lance B.
Address:
Austin, TX
No. of patents:
1
Patents:












Patent Number Title Of Patent Date Issued
5897375 Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit ma April 27, 1999
A method for chemical mechanical polishing (CMP) a copper layer (22) begins by forming the copper layer (22). The copper layer (22) is then exposed to a slurry (24). The slurry (24) contains an oxidizing agent such as H.sub.2 O.sub.2, a carboxylate salt such as ammonium citrate, an abras










 
 
  Recently Added Patents
Method of treating a preceramic material
Battery loading and unloading mechanism
Simulation parameter correction technique
Rose plant named `ESM R057`
Switching element for a valve train of an internal combustion engine
Vibration power generator and vibration power generation device, and communication device and electronic equipment with vibration power generation device
Information storage medium, reproducing method, and recording method
  Randomly Featured Patents
Computing device assistance for phone based customer service representative interaction
Monitoring device for a therapy device and process
Surface-plasmon-assisted optical frequency conversion
Purification of a triple helix formation with an immobilized oligonucleotide
Method for improving resource allocation in a wireless communications system using broadcast resource information
Endotracheal tube with aerosol delivery feature
Drain Gasket
Bottle
Image processing device, computer-readable storage medium, and image processing method
Loop-gap resonator for localized NMR imaging