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Chung; Dae-Hyuk
Gyeonggi-do, KR
No. of patents:

Patent Number Title Of Patent Date Issued
6946431 Cleaning solution including aqueous ammonia solution, acetic acid and deionized water for integr September 20, 2005
Cleaning solutions for integrated circuit devices and methods of cleaning integrated circuit devices using the same are disclosed. The cleaning solution includes about 30% aqueous ammonia solution, acetic acid by a volume percent higher then a volume percent of the aqueous ammonia so
6875706 Cleaning solution and method of cleaning a semiconductor device using the same April 5, 2005
In a cleaning solution and a method of cleaning a semiconductor substrate, the cleaning solution includes about 1 to about 10 percent by weight of sulfuric acid, about 0.5 to about 5 percent by weight of aqueous hydrogen peroxide solution, and about 85 to about 98.5 percent by weight of

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