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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Chou; Stephen Y.
Address:
Princeton, NJ
No. of patents:
27
Patents:












Patent Number Title Of Patent Date Issued
8192669 Methods for fabricating large area nanoimprint molds June 5, 2012
This invention relates to the fabrication of large area nanoimprint molds having complex patterns with minimal or no use of direct-writing, such as electron beam lithography, ion, laser beam, or mechanical beam lithography. This can be accomplished by forming a pattern of simple nano
8163657 Process for adjusting the size and shape of nanostructures April 24, 2012
In accordance with the invention, a lateral dimension of a microscale device on a substrate is reduced or adjusted by the steps of providing the device with a soft or softened exposed surface; placing a guiding plate adjacent the soft or softened exposed surface; and pressing the gui
8163656 Process for adjusting the size and shape of nanostructures April 24, 2012
In accordance with the invention, a lateral dimension of a microscale device on a substrate is reduced or adjusted by the steps of providing the device with a soft or softened exposed surface; placing a guiding plate adjacent the soft or softened exposed surface; and pressing the gui
8128856 Release surfaces, particularly for use in nanoimprint lithography March 6, 2012
A method to forming a pattern on a surface of a substrate, including the steps of providing a mold having a molding surface comprised of one or more protruding features and one or more recessed features for imprinting a pattern. The pattern comprising at least one feature having a latera
8087922 Imprint lithography with improved substrate/mold separation January 3, 2012
In imprint lithography, a mold having a pattern of projecting and recessed regions is pressed into a moldable surface on a substrate. The thus-imprinted moldable surface is permitted to at least partially harden to retain the imprint, and the substrate and mold are separated. In acco
8025829 Die imprint by double side force-balanced press for step-and-repeat imprint lithography September 27, 2011
In accordance with the invention, step-and-repeat imprint lithography is effected by applying balanced pressing forces from both sides of a substrate. The pressing forces are substantially equal in amplitude and opposite in direction. With the pressing forces thus balanced, the fixtu
7887739 Methods and apparatus of pressure imprint lithography February 15, 2011
An improved method of imprint lithography involves using fluid-induced pressure from electric or magnetic fields to press a mold onto a substrate having a moldable surface. In essence, the method comprises the steps of providing a substrate having a moldable surface, providing a mold
7758794 Method of making an article comprising nanoscale patterns with reduced edge roughness July 20, 2010
In accordance with the invention, an article comprising a nanoscale surface pattern, such as a grating, is provided with a nanoscale patterns of reduced edge and/or sidewall roughness. Smooth featured articles, can be fabricated by nanoimprint lithography using a mold having sloped p
7700498 Self-repair and enhancement of nanostructures by liquification under guiding conditions April 20, 2010
In accordance with the invention, the structure (10A, 10B) of a patterned nanoscale or near nanoscale device ("nanostructure") is repaired and/or enhanced by liquifying the patterned device in the presence of appropriate guiding conditions for a period of time and then permitting the
7670770 Nanochannel arrays and their preparation and use for high throughput macromolecular analysis March 2, 2010
Nanochannel arrays that enable high-throughput macromolecular analysis are disclosed. Also disclosed are methods of preparing nanochannel arrays and nanofluidic chips. Methods of analyzing macromolecules, such as entire strands of genomic DNA, are also disclosed, as well as systems for
7635262 Lithographic apparatus for fluid pressure imprint lithography December 22, 2009
Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by
7588657 Pattern-free method of making line gratings September 15, 2009
In accordance with the invention, substrate-supported linear arrays are formed by the steps of adhering a thin layer of polymer between a pair of substrates and separating the substrates perpendicular to the layer. The polymer layer separates to form substrate-supported polymer gratings
7510946 Method for filling of nanoscale holes and trenches and for planarizing of a wafer surface March 31, 2009
A processing method for use in the fabrication of fabrication of nanoscale electronic, optical, magnetic, biological, and fluidic devices and structures, for filling nanoscale holes and trenches, for planarizing a wafer surface, or for achieving both filling and planarizing of a wafer
7482057 Microscale patterning and articles formed thereby January 27, 2009
The present invention is directed to a lithographic method and apparatus for creating micrometer sub-micrometer patterns in a thin film coated on a substrate. The invention utilizes the self-formation of periodic, supramolecular pillar arrays (49) in a melt to form the patterns. The
7322287 Apparatus for fluid pressure imprint lithography January 29, 2008
Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by
7317739 Mode-locked laser using a mode-locking wavelength selective reflector January 8, 2008
In accordance with the invention, a mode-locked laser comprises an optical gain medium disposed within an optical cavity formed by a first reflector and a wavelength selective second reflector to achieve mode-locking operation. Advantageously, the wavelength reflective reflector is a
7282456 Self-repair and enhancement of nanostructures by liquification under guiding conditions October 16, 2007
In accordance with the invention, the structure of a patterned nanoscale or near nanoscale device ("nanostructure") is repaired and/or enhanced by liquifying the patterned device in the presence of appropriate guiding conditions for a period of time and then permitting the device to
7211214 Laser assisted direct imprint lithography May 1, 2007
In accordance with the invention, features can be directly imprinted into the surface of a solid substrate. Specifically, a substrate is directly imprinted with a desired pattern by the steps of providing a mold having a molding surface to imprint the pattern, disposing the molding surfa
7137803 Fluid pressure imprint lithography November 21, 2006
An improved method of imprint lithography involves using direct fluid pressure to press the mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplish
6999156 Tunable subwavelength resonant grating filter February 14, 2006
In accordance with the invention, a tunable subwavelength resonant grating filter comprises a liquid crystal cell having a pair of major surface walls. One wall of the cell is a coated subwavelength grating of a SRGF. The coating comprises a polymer layer to fill the grating trenches and
6946360 Fluid pressure bonding September 20, 2005
An improved method of bonding involves using direct fluid pressure to press together the layers to be bonded. Advantageously one or more of the layers are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by sealing an assembl
6876784 Optical polarization beam combiner/splitter April 5, 2005
An optical device for combining two orthogonally polarized beams or splitting a beam into two orthogonally polarized beams is provided that utilizes two collimating/focusing lenses and a thin film wire-grid polarizer. Because the thin film wire-grid polarizer can be fabricated in ver
6828244 Method and apparatus for high density nanostructures December 7, 2004
A method and apparatus for high density nanostructures is provided. The method and apparatus include Nano-compact optical disks, such as nano-compact disks (Nano-CDS). In one embodiment a 400 Gbit/in.sup.2 topographical bit density nano-CD with nearly three orders of magnitude higher
6809356 Method and apparatus for high density nanostructures October 26, 2004
A method and apparatus for high density nanostructures is provided. The method and apparatus include Nano-compact optical disks, such as nano-compact disks (Nano-CDS). In one embodiment a 400 Gbit/in.sup.2 topographical bit density nano-CD with nearly three orders of magnitude higher
6713238 Microscale patterning and articles formed thereby March 30, 2004
The formation of self-assembled patterns in a substrate through deformation induce by a mask placed above the substrate are disclosed. Methods of the present invention may be used to form arrays of nanometer sized pillars as well as mesas from a thin deformable layer of the substrate or
6518189 Method and apparatus for high density nanostructures February 11, 2003
A method and apparatus for high density nanostructures is provided. The method and apparatus include Nano-compact optical disks, such as nano-compact disks (Nano-CDS). In one embodiment a 400 Gbit/in.sup.2 topographical bit density nano-CD with nearly three orders of magnitude higher
6482742 Fluid pressure imprint lithography November 19, 2002
An improved method of imprint lithography involves using direct fluid pressure to press the mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished b










 
 
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