| Patent Number |
Title Of Patent |
Date Issued |
| RE30244 |
Radial flow reactor including glow discharge limitting shield |
April 1, 1980 |
| An improved radio frequency (rf) powered radial flow cylindrical reactor utilizes a gas shield which substantially limits the glow plasma discharge reaction to a section of the reactor over the semiconductor substrates which are to be coated. The gas shield permits the use of higher rf i |
| 4171489 |
Radiation mask structure |
October 16, 1979 |
| The discovery that boron nitride and boron carbide films can be made in tension allows nondistorting radiation windows or masks to be realized. Both low and high pressure techniques for making the tensile films lead to related mask structures utilizing such films. The resulting structure |
| 4134125 |
Passivation of metallized semiconductor substrates |
January 9, 1979 |
| Disclosed is a method and structure for protecting circuit components from the ambient and in particular for protecting the contact metal from the adverse effects of moisture. A first layer of amorphous silicon is deposited over the circuit including the metal contacts. A second layer |
