| Patent Number |
Title Of Patent |
Date Issued |
| 7611806 |
Sub-wavelength diffractive elements to reduce corner rounding |
November 3, 2009 |
| The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first element having a side that is smaller than a wavelength of said light; a second region ne |
| 7512926 |
Phase-shifting masks with sub-wavelength diffractive optical elements |
March 31, 2009 |
| The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a s |
| 7438997 |
Imaging and devices in lithography |
October 21, 2008 |
| Systems and techniques for lithography. In one aspect, a method includes producing a microelectronic device by modulating an intensity and a phase of the zero diffraction order of a radiation with a device including subwavelength features having a pitch dimension smaller than one wav |
| 7254803 |
Test structures for feature fidelity improvement |
August 7, 2007 |
| Systems and techniques for generating test structures. The test structures may conform to a set of design rules for a portion of an integrated circuit design. The test structures may include base figures, which may be in an enriched environment. For example, the test structures may i |
| 7245352 |
Alignment using latent images |
July 17, 2007 |
| Systems and techniques for alignment with latent images. In one implementation, a method includes detecting a location of a latent image on a substrate, repositioning the substrate based on the detected location of the latent image, and patterning the substrate. |
| 7142282 |
Device including contacts |
November 28, 2006 |
| A device that includes contacts. In one implementation, a device includes a substantially arbitrary arrangement of contacts. The contacts in the device are defined with a definition characteristic of interference lithography. |
| 6069739 |
Method and lens arrangement to improve imaging performance of microlithography exposure tool |
May 30, 2000 |
| A technique for introducing variable phase delay across portions of a spatially coherent light beam, such as a laser, without changing the focal length of the portions of the beam. A fly's-eye lens array is utilized to distribute the light for a more uniform illumination, but different l |
| 6021009 |
Method and apparatus to improve across field dimensional control in a microlithography tool |
February 1, 2000 |
| A technique for improving across field dimensional control in a microlithography tool. In a lithography imaging process in which a pattern on a mask is projected to form latent images in a photosensitive medium, the critical dimension distribution across the imaging field varies due to |
| 5946079 |
Photolithography method using coherence distance control |
August 31, 1999 |
| A method for mapping coherence and a method and system for reducing varying coherence conditions of a stepper field exposure tool used in lithographic patterning. The present invention describes a method and system to reduce the effective light source of a stepper field exposure tool in |
| 5840448 |
Phase shifting mask having a phase shift that minimizes critical dimension sensitivity to manufa |
November 24, 1998 |
| A reticle having only one phase delay value for a given wavelength of incident radiation. The reticle includes a first and second region, both transparent to incident radiation. The second region being adjacent to said first region. The incident radiation transmitted by the second region |
| 5801821 |
Photolithography method using coherence distance control |
September 1, 1998 |
| A method for mapping coherence and a method and system for reducing varying coherence conditions of a stepper field exposure tool used in lithographic patterning. The present invention describes a method and system to reduce the effective light source of a stepper field exposure tool in |
| 4767215 |
Lens characterization apparatus and method |
August 30, 1988 |
| A beam of light, such as a laser, is used to scan across a lens. The beam passing through the lens is modulated by an optical encoder which controls the amount of the beam passing through the encoder to a light receptor. The received light is quantified and processed to determine any dis |
