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Inventor: Asai; Kunio
Address: Ohi, JP
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 4742012 |
Method of making graded junction containing amorphous semiconductor device |
May 3, 1988 |
| This invention discloses a new semiconductor device having no step type p-i-n juctions but rather has a graded p-i-n juction. The semiconductor device shows a high photoelectric conversion efficiency, and since said device can be produced easily with good reproducibility by a plasma |
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