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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Amemiya; Mitsuaki
Address:
Utsunomiya, JP
No. of patents:
4
Patents:












Patent Number Title Of Patent Date Issued
6642528 Alignment mark detection method, and alignment method, exposure method and device, and device pr November 4, 2003
An apparatus and method for detecting an alignment mark on a substrate using electron beams. The method include the steps of setting an accelerating voltage of the electron beams in accordance with the layer structure of the substrate, irradiating the substrate with the electron beam
6331709 Alignment mark detection method, and alignment method, exposure method and device, and device pr December 18, 2001
An apparatus and method for detecting an alignment mark on a substrate using electron beams. The method include the steps of setting an accelerating voltage of the electron beams in accordance with the layer structure of the substrate, irradiating the substrate with the electron beam
5835560 Exposure apparatus November 10, 1998
An exposure apparatus includes a mirror for reflecting radiation light from a light source, a driving mechanism for holding and oscillating the mirror, a detector for detecting the position of a beam of the radiation light projected on the mirror, an adjusting mechanism for adjusting the
5604779 Optical exposure method and device formed by the method February 18, 1997
A transfer magnification correcting method suited for use in scanning exposure by use of synchrotron radiation or the like. In proximity exposure according to the scanning exposure method by use of synchrotron radiation, the magnification in the scanning direction is corrected by rel










 
 
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