| Patent Number |
Title Of Patent |
Date Issued |
| 7483196 |
Apparatus for multiple beam deflection and intensity stabilization |
January 27, 2009 |
| A multiple beam generator for use in a scanning system, wherein the generator includes an acousto-optic deflector (AOD) which during use receives a laser beam and generates a deflected beam, the deflection of which is determined by an AOD control signal; a diffractive element which g |
| 7095037 |
Electron beam lithography system having improved electron gun |
August 22, 2006 |
| An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application |
| 6897888 |
Scanning brush and method of use |
May 24, 2005 |
| A scanning system uses a multi-beam brush having a widely separated beams, a modulator that controls intensity of pixels in scan beams, an optical system that minimizes scan line bow at the expense of non-uniform scanning beam velocity, and a timing generator that generates a pixel clock |
| 6828574 |
Modulator driven photocathode electron beam generator |
December 7, 2004 |
| The present invention provides a source of multiple beams of electrons having a desired spatial pattern, as typically used for multiple beam lithography. A source of radiation, typically ultraviolet radiation, is directed onto a modulator and from the modulator onto a photocathode. The |
| 6751000 |
Reflective diffraction of radiation beams for image registration |
June 15, 2004 |
| In a method of registering an image on a substrate, the substrate is placed on a substrate support and a radiation beam is directed toward the substrate. The radiation beam is reflectively diffracted to modulate the intensity of the radiation beam. The modulated radiation beam is scanned |
| 6731320 |
Laser pattern generator |
May 4, 2004 |
| A scanning system uses a multi-beam brush having a widely separated beams, a modulator that controls intensity of pixels in scan beams, an optical system that minimizes scan line bow at the expense of non-uniform scanning beam velocity, and a timing generator that generates a pixel clock |
| 6724002 |
Multiple electron beam lithography system with multiple beam modulated laser illumination |
April 20, 2004 |
| An electron beam lithography system includes a laser for generating a laser beam, and a beam splitter for splitting the laser beam into a plurality of light beams. The intensity of the light beams is individually modulated. The light beams are of sufficient energy such that, when they im |
| 6532097 |
Image registration apparatus having an adjustable reflective diffraction grating and method |
March 11, 2003 |
| An image registration apparatus has a substrate support capable of supporting a substrate, the substrate support having a support motor capable of moving the substrate support. A radiation beam source is provided that is capable of providing a radiation beam. A beam intensity modulat |
| 6448568 |
Electron beam column using high numerical aperture photocathode source illumination |
September 10, 2002 |
| A lithography apparatus including both a laser beam source and an electron beam column, where the electron beam column has a support(in one embodiment a window in the column housing) having an index of refraction n. The support, having a photocathode source material disposed on its r |
| 6295157 |
Thermally balanced acousto-optic modulator |
September 25, 2001 |
| An acousto-optic modulator for use with a multi-channel laser beam system, for instance, is of conventional structure except that two different RF (radio frequency) signals drive the modulator. These signals each produce at least one output beam as diffracted by the modulator body. These |
| 6271514 |
Multi-beam scanner including a dove prism array |
August 7, 2001 |
| A precision printing system uses multiple scan beams that an acousto-optic modulator (AOM) separately modulates. An array of optical elements such as dove prisms separately rotates each of the beams about a central ray of the beam to eliminate blurred edges, skew, and variations in line |
| 6037967 |
Short wavelength pulsed laser scanner |
March 14, 2000 |
| A laser pattern generator for semiconductor mask making or direct writing of features on a semiconductor wafer uses a pulsed laser source to achieve high power and short wavelength (e.g. 263 nm or less) radiation, for writing very small-sized features. The laser pulse frequency is either |
| 5815245 |
Scanning lithography system with opposing motion |
September 29, 1998 |
| A small field scanning photolithography system uses opposing motion of a reticle and a blank to compensate for image reversal by a projection system such as a conventional Wynne-Dyson optical system which forms a reverted image on a blank. The reticle has a reverted pattern. During s |
| 5781346 |
Magnification correction for small field scanning |
July 14, 1998 |
| Magnification correction for small field scanning of large blanks is provided by adding magnification adjusting elements (lenses) to a double pass Wynne-Dyson lens or other type of one-to-one projection lens. The magnification adjusting optical elements includes two pairs of low power |
| 5757469 |
Scanning lithography system haing double pass Wynne-Dyson optics |
May 26, 1998 |
| A small field scanning photolithography system has a double pass Wynne-Dyson optical system which provides an erect, non-reverted, unmagnified image. An optical path through the system passes from an object, reflects off an input reflector, passes through a first quadrant of a lens, |
| 5739964 |
Magnification correction for small field scanning |
April 14, 1998 |
| Magnification correction for small field scanning of large blanks is provided by adding magnification adjusting elements (lenses) to a double pass Wynne-Dyson lens or other type of one-to-one projection lens. The magnification adjusting optical elements includes two pairs of low power |
| 5386221 |
Laser pattern generation apparatus |
January 31, 1995 |
| An improved laser pattern generation apparatus. The improved pattern generation apparatus of the present invention uses a laser beam to expose a radiant sensitive film on the workpiece to print circuit patterns on a substrate. The laser beam is aligned using a beam steering means. The |
| 5255051 |
Small field scanner |
October 19, 1993 |
| A method and apparatus for printing arbitrarily large circuit patterns using small field optics. The use of small field imaging optics allows the use of high NA lens designs capable of printing smaller geometries than otherwise would be possible. The field size in a first axis is extende |
| 5227839 |
Small field scanner |
July 13, 1993 |
| A method and apparatus for printing arbitrarily large circuit patterns using small field optics. The use of small field imaging optics allows the use of high NA lens designs capable of printing smaller geometries than otherwise would be possible. The field size in a first axis is extende |
| 4956650 |
Pattern generation system |
September 11, 1990 |
| An improved pattern generation system. The pattern generation system of the present invention discloses an improved optical system for correcting problems of astigmatism and ellipticity in a radiant energy beam used for generating patterns on a workpiece. The present invention further |
| 4797696 |
Beam splitting apparatus |
January 10, 1989 |
| An apparatus for splitting radiant energy beams produced by a laser or other light source. The apparatus comprises a plurality of mirrors, each aligned to reflect a beam or plurality of beams from one mirror to the next. Each mirror comprises a glass body with a layer of 50% reflective |
| 4796038 |
Laser pattern generation apparatus |
January 3, 1989 |
| A laser pattern generation apparatus particularly suited for semiconductor applications. The laser beam is split into a plurality of beams and modulated with acousto-optic modulators. A rotating mirror having a plurality of facets causes the beam to scan the workpiece. |
