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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Abe; Takahiro
Address:
Hofu, JP
No. of patents:
1
Patents:




Patent Number Title Of Patent Date Issued
7224568 Plasma processing method and plasma processing apparatus May 29, 2007
In a plasma processing apparatus using electrostatic chuck, increase of plasma potential is prevented and abnormal discharge is avoided. The plasma processing apparatus comprises an RF source for generating plasma in a vacuum container, another RF source for applying an RF bias power to


 
 
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