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Inventor: Abe; Takahiro
Address: Hofu, JP
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 7224568 |
Plasma processing method and plasma processing apparatus |
May 29, 2007 |
| In a plasma processing apparatus using electrostatic chuck, increase of plasma potential is prevented and abnormal discharge is avoided. The plasma processing apparatus comprises an RF source for generating plasma in a vacuum container, another RF source for applying an RF bias power to |
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