| |
|
Inventor: Abe; Masahito
Address: Fujishawa, JP
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 6312569 |
Chemical vapor deposition apparatus and cleaning method thereof |
November 6, 2001 |
| A chemical vapor deposition apparatus for depositing a thin film of highly dielectric materials for giga-capacity memory devices can reliably clean reaction products formed within the deposition chamber without sacrificing the production efficiency. The apparatus comprises a hermetic dep |
|
|
|