Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Abe; Kichio
Address:
Yokohama, JP
No. of patents:
2
Patents:




Patent Number Title Of Patent Date Issued
4110840 Sense line charging system for random access memory August 29, 1978
A random access memory includes a column of static MOS storage cells. Two sense-write conductors are coupled to each cell in the column. Each sense-write conductor is also coupled, respectively, to a termination MOSFET. The first sense-write conductor of each column of storage cells is
4099265 Sense line balance circuit for static random access memory July 4, 1978
A random access memory includes a column of static MOS storage cells. Two sense-write write conductors are coupled to each cell in the column. The first sense-write conductor of each column of storage cells is coupled by means of a first coupling MOSFET to a first bit-sense conductor. Th


 
 
  Recently Added Patents
System and method for management of resources in emergency and operational situations
Positioning a flexible printed circuit board in a mobile telecommunication terminal
Heterogeneous multi-core processor having dedicated connections between processor cores
Maintaining availability during change of resource dynamic link library in a clustered system
Single crystalline gallium nitride thick film having reduced bending deformation
System executing a fast boot wake-up
Method and apparatus for labeling using optical identification elements characterized by X-ray diffraction
  Randomly Featured Patents
Apparatus for mixing and metering flowable solid materials
Solar energy collector
Bicycle sprocket unit
Process for making an electrical component having a metallic casing with a conformable plastic coating
Apparatus and method for dispensing a slurry
Digital broadcast receiver
Thermoplastic elastomer molding
Corrosion resistant steel components and method of manufacture thereof
High-efficiency power charge pump supplying high DC output currents
Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography