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Inventor: Abdulhalim; Ibrahim
Address: Kfar Manda, IL
No. of patents: 3
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 7173699 |
Spectroscopic scatterometer system |
February 6, 2007 |
| Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous m |
| 6590656 |
Spectroscopic scatterometer system |
July 8, 2003 |
| Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous m |
| 6483580 |
Spectroscopic scatterometer system |
November 19, 2002 |
| Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous m |
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