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Inventor: Abdallah; David
Address: Bernardsville, NJ
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 7550249 |
Base soluble polymers for photoresist compositions |
June 23, 2009 |
| Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at .alpha.-position and/or .beta.-position and/or .gamma.-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described. |
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