Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of fabricating semiconductor device










Image Number 11 for United States Patent #8426285.

An ion implantation is performed to implant ions into a silicon substrate, and a microwave irradiation is performed to irradiate the silicon substrate with microwaves after the ion implantation. After the microwave irradiation, the silicon substrate is transferred to a heat-treatment apparatus, where the silicon substrate is treated with heat by being irradiated with light having a pulse width ranging from 0.1 milliseconds to 100 milliseconds, both inclusive.








 
 
  Recently Added Patents
Image quality assessment
Image processing device, image forming apparatus, and non-transitory computer readable recording medium
Device for identifying types of document files
Organic light emitting display device and method of manufacturing the same
Adaptive block pre-fetching method and system
Steering wheel
Landscape post for solar and other light fixtures
  Randomly Featured Patents
Stacking quad pre-molded component packages, systems using the same, and methods of making the same
Image forming apparatus having apparatus main assembly and a process cartridge including non-contact memory performing non-contact data communication with the apparatus main assembly
Portable traffic light
Collection and testing of infant urine using an absorbent article
Spacer barrier structure to prevent spacer voids and method for forming the same
Pyroelectric detector array with optical filter elements
Anti-theft system for motor vehicles
Bottle holder
Motorcycle fairing radiator vent trim assembly
Preparation of quinic acid derivatives