Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of fabricating semiconductor device










Image Number 11 for United States Patent #8426285.

An ion implantation is performed to implant ions into a silicon substrate, and a microwave irradiation is performed to irradiate the silicon substrate with microwaves after the ion implantation. After the microwave irradiation, the silicon substrate is transferred to a heat-treatment apparatus, where the silicon substrate is treated with heat by being irradiated with light having a pulse width ranging from 0.1 milliseconds to 100 milliseconds, both inclusive.








 
 
  Recently Added Patents
Pill identification and counterfeit detection method
Arrays of optical confinements and uses thereof
Controller interface providing improved data reliability
Spread spectrum communication system and transmission power control method therefor
Mobile tablet information handling system support
Authenticating and off-loading IPTV operations from mobile devices to fixed rendering viewing devices
Image forming apparatus
  Randomly Featured Patents
Method and apparatus for increasing the power capability of a power supply
Injection molding apparatus comprising a stack mold
10/100 mb clock recovery architecture for switches, repeaters and multi-physical layer ports
Process for the preparation of halophthalic anhydrides
Alternating potential electrostatic separator of particles with different physical properties
Electronic ballast lighting power control device
Method of feeding individual fibers to a spinning rotor and device for carrying out the method
Pledget loading apparatus
High-gradient magnetic separator
Methods and apparatus for drilling with a multiphase pump