Resources Contact Us Home
Method and apparatus for manufacturing semiconductor substrate dedicated to semiconductor device, and method and apparatus for manufacturing semiconductor device

Image Number 13 for United States Patent #8357592.

A method for manufacturing a semiconductor substrate dedicated to a semiconductor device, in which multi-photon absorption is generated in a micro-region inside the semiconductor substrate by condensing laser beams in any micro-region inside the semiconductor substrate, and a gettering sink is formed by changing the crystal structure of only the micro-region.

  Recently Added Patents
Method and apparatus for producing homogeneous magnetic fields
Navigation device, navigation method, and navigation program
Method and system for constructing a customized web analytics application
Reserving a time block in a calendar application to account for a travel time between geographic locations of appointments
Photoelectric conversion device
Electric washing machine
Display module
  Randomly Featured Patents
Spin-on-glass anti-reflective coatings for photolithography
Apparatus and method for use in harvesting crops of the genus Brassica
Circuit configuration for a fixed-frequency blocking oscillator converter switching power supply
Noise suppression by adaptive speed regulation of towed marine geophysical streamer
Telephone line interface
Gaming system with location verification
Precision assembleable surgical tool handle with limited-play interconnect mechanism
Injection process and injection apparatus for solidifying a ground
System for generating an audible cue indicating the status of a display object
System and method for supplying and updating information from one or more works to one or more remote user devices in a readily accessible form, and remote user device for use therein