Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Superimpose photomask and method of patterning










Image Number 7 for United States Patent #8133661.

Provided is a photomask that includes a substrate having a first region and a second region, a first pattern disposed in the first region of the substrate, and a second pattern disposed in the second region of the substrate. The first and second patterns are a decomposition of a design pattern to be transferred onto a wafer in a lithography process.








 
 
  Recently Added Patents
Ventilated vacuum communication structure
Managing and collaborating with digital content
Peer-to-peer method of deploying and managing executable code and associated plug-ins
Memory device having collaborative filtering to reduce noise
Electronic device including predicted frequency error estimation of a voltage controlled oscillator and related methods
Method for manufacturing non-volatile memory device, non-volatile memory element, and non-volatile memory device
Shipping container explosives and contraband detection system using nuclear quadrupole resonance
  Randomly Featured Patents
Fuel injection nozzles
Electric connector having ground contacts formed from a grounding shield
Flow meter including improved laminar flow restrictor device therefor
Code conversion method and apparatus
Multicolor tinter tank system
Process for recovering L-amino acids from fermentation liquors containing them
System and method for a communication terminal to manage memory and maintain a current application version for multiple applications
Method for making a self-locking knot in a stator lacing machine
Molding sand mixtures
Interface module for communication with an electronic or an electromechanical device of a medium voltage interruption unit