Resources Contact Us Home
Superimpose photomask and method of patterning

Image Number 7 for United States Patent #8133661.

Provided is a photomask that includes a substrate having a first region and a second region, a first pattern disposed in the first region of the substrate, and a second pattern disposed in the second region of the substrate. The first and second patterns are a decomposition of a design pattern to be transferred onto a wafer in a lithography process.

  Recently Added Patents
Method for mapping resource units
Delivery of captions, content advisory and other data through digital interface
System and method for computational unification of heterogeneous implicit and explicit processing elements
Method and apparatus for management and analysis of services in VoIP networks
Fixing device and image forming apparatus
System for providing access to playable media
Electronic component and a system and method for producing an electronic component
  Randomly Featured Patents
Apparatus for positioning devices for operating upon sheets or webs
Method and apparatus for reproducing half-tone images
Optical test structure for measuring charge-transfer efficiency
Liquid crystal display
Hydrogenation catalysts and process of making said catalyst
Method of manufacturing a thin film transistor array panel
Process for the preparation of 2'-halo-.beta.-L-arabinofuranosyl nucleosides
Radar device and a method for suppressing interference in a radar device
System and method for closed loop gyroscope stabilization
Floating chemical dispenser with delay for swimming pools