Resources Contact Us Home
Superimpose photomask and method of patterning

Image Number 7 for United States Patent #8133661.

Provided is a photomask that includes a substrate having a first region and a second region, a first pattern disposed in the first region of the substrate, and a second pattern disposed in the second region of the substrate. The first and second patterns are a decomposition of a design pattern to be transferred onto a wafer in a lithography process.

  Recently Added Patents
Method and apparatus for storing email messages
Device and method including a soldering process
Technique for manufacturing bit patterned media
Blocky hydroxyethylcellulose, derivatives thereof, process of making and uses thereof
Communication device and two-dimensional communication system using the same
Temporary protective cover for an exposed junction box
Pixel interleaving configurations for use in high definition electronic sign displays
  Randomly Featured Patents
System having multiple agents on optical and electrical bus
Method and apparatus for operating a water-jet pump
Control system for an engine aftertreatment system
Wafer-level package with silicon gasket
Fishing rod connector
Disposable cushion pad for intra-oral X-ray films
Storage media transducer loading/unloading and carriage lock mechanism
Jet burner construction heating apparatus utilizing the jet burner construction and methods of making the same
Illuminating device with optical element
Process for preparing mold