Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Superimpose photomask and method of patterning










Image Number 7 for United States Patent #8133661.

Provided is a photomask that includes a substrate having a first region and a second region, a first pattern disposed in the first region of the substrate, and a second pattern disposed in the second region of the substrate. The first and second patterns are a decomposition of a design pattern to be transferred onto a wafer in a lithography process.








 
 
  Recently Added Patents
Cascode circuit device with improved reverse recovery characteristic
System and method for detecting malicious code executed by virtual machine
Loudspeaker grille
Method and system for accomplishing user equipment purge
Isoselective polymerization of epoxides
Method and system for reduction of quantization-induced block-discontinuities and general purpose audio codec
Configurations and methods for effluent gas treatment
  Randomly Featured Patents
Paper support stand
Vapor trap system for detecting volatile organic chemical vapors
Flip chip bonded semiconductor device with shelf and method of manufacturing thereof
Roll with inner and outer, spaced axially extending triangular mesh strips
System for producing verifiable kiosk receipts and records
Case for a hand-held computer
Process for the preparation of substituted cycloketones
Copper interconnect
Belt loop attachable watch
Process for heat treating superconductor wire