Resources Contact Us Home
Superimpose photomask and method of patterning

Image Number 7 for United States Patent #8133661.

Provided is a photomask that includes a substrate having a first region and a second region, a first pattern disposed in the first region of the substrate, and a second pattern disposed in the second region of the substrate. The first and second patterns are a decomposition of a design pattern to be transferred onto a wafer in a lithography process.

  Recently Added Patents
Non-volatile flash-RAM memory with magnetic memory
Method and system of extending battery life of a wireless microphone unit
Vehicle-mounted camera stabilized passively by vibration isolators
Method and device for managing devices in device management system
Image forming apparatus detecting color patterns and generating interleaf images at predetermined position
Epilation apparatus
Portable computer display structures
  Randomly Featured Patents
Power transmission apparatus and four wheel drive equipped with the same
Transportable office work station
Guide catheters for accessing cardiac sites
LCD device with plural fluorescent tube backlight for a rectangular curved display surface of a radius of from two to four times as large as the length of the short-side of the rectangular dis
Methods for producing improved epitaxial materials
Apparatus for dispersing agglomerates
Magnetic recording media
Surgical instrument
Plasma display panel with improved barrier ribs
Lifting arrangements for massive objects