Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Superimpose photomask and method of patterning










Image Number 7 for United States Patent #8133661.

Provided is a photomask that includes a substrate having a first region and a second region, a first pattern disposed in the first region of the substrate, and a second pattern disposed in the second region of the substrate. The first and second patterns are a decomposition of a design pattern to be transferred onto a wafer in a lithography process.








 
 
  Recently Added Patents
Ultrasonic probe, charger, ultrasonic diagnostic apparatus and ultrasonic diagnostic system
Digital downconversion and fast channel selection of narrowband signals using a wide band RF tuner
Method and apparatus of transmitting and receiving backhaul downlink control information in a wireless communication system
Wall panel
Method and apparatus for controlling diameter of a silicon crystal ingot in a growth process
Offset optimization system
Method and apparatus of identifying objects of interest using imaging scans
  Randomly Featured Patents
Bedding accessory for article storage
Method for making cetirizine tablets
Systems and methods for solder bonding
Dental syringe attachment for shower
Continuously operating automatic strip winding device
Fastener buckle
Portable computer with a telephone docking station
Battery circuit with non-volitable memory and thermistor on a single line
Method of erecting a tower crane from two groups of modular tower sections differing in cross section
Personal domain controller