Resources Contact Us Home
On-track process for patterning hardmask by multiple dark field exposures

Image Number 6 for United States Patent #8133659.

This invention provides methods of creating via or trench structures on a developer-soluble hardmask layer using a multiple exposure-development process. The hardmask layer is patterned while the imaging layer is developed. After the imaging layer is stripped using organic solvents, the same hardmask can be further patterned using subsequent exposure-development processes. Eventually, the pattern can be transferred to the substrate using an etching process.

  Recently Added Patents
Titanium compounds and complexes as additives in lubricants
Software execution management apparatus, method, and computer-readable medium thereof
End to end email monitor
Random sampling for geophysical acquisitions
Sensor coating
System and method for calibrating display device using transfer functions
System and method for controlling device location determination
  Randomly Featured Patents
Magnetron sputtering cathode with magnet disposed between two yoke plates
Television synchronizing pulse generating system
Optical disc apparatus
Portable wireless apparatus
Portable electronic device incorporating extendable thermal module
Windrow turning apparatus
Exterior surface of a container sidewall
Glucose measuring device for use in personal area network
Game mover
Insecticide and molluscicide composition and methods