Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
On-track process for patterning hardmask by multiple dark field exposures










Image Number 6 for United States Patent #8133659.

This invention provides methods of creating via or trench structures on a developer-soluble hardmask layer using a multiple exposure-development process. The hardmask layer is patterned while the imaging layer is developed. After the imaging layer is stripped using organic solvents, the same hardmask can be further patterned using subsequent exposure-development processes. Eventually, the pattern can be transferred to the substrate using an etching process.








 
 
  Recently Added Patents
Method for controlled layer transfer
Asynchronous task execution
Breathing mask
Tiger paw stationary tab
Spalling utilizing stressor layer portions
Target output device and extreme ultraviolet light source apparatus
Method and system for testing indirect bandgap semiconductor devices using luminescence imaging
  Randomly Featured Patents
On-line parametric histogram normalization for noise robust speech recognition
Method and apparatus for automatic remote testing of backflow preventers
Balanced linked lists for high performance data buffers in a network device
Gellan gum to improve physical stability of liquid nutritional products
Liquid applicator
Wall mounted water purifier for home use
Dynamic DSP allocation for universal access to a packet network
Fluid operated vibratory oil well drilling tool with anti-chatter switch
Dipeptidylpeptidases and methods of use
High pressure discharge lamp