Resources Contact Us Home
On-track process for patterning hardmask by multiple dark field exposures

Image Number 6 for United States Patent #8133659.

This invention provides methods of creating via or trench structures on a developer-soluble hardmask layer using a multiple exposure-development process. The hardmask layer is patterned while the imaging layer is developed. After the imaging layer is stripped using organic solvents, the same hardmask can be further patterned using subsequent exposure-development processes. Eventually, the pattern can be transferred to the substrate using an etching process.

  Recently Added Patents
Packaging sleeve
Automated solar collector installation design including ability to define heterogeneous design preferences
Method and apparatus for modeling computer program behaviour for behavioural detection of malicious program
Test framework of visual components in a multitenant database environment
UV liquid treatment system
Porous objects having immobilized encapsulated biomolecules
  Randomly Featured Patents
Turbine airfoil for gas turbine engine
Unloading system for freight containers
Heel cleat for a snowshoe
Data carrier having encapsulated scents and a method for producing it
Structural ring interconnect printed circuit board assembly for a ducted fan unmanned aerial vehicle
Mapping deep structured data structures
Gas regulator flash hider
Polyolefin composition
Flask clamp retaining means and method
Lawn chair