Resources Contact Us Home
On-track process for patterning hardmask by multiple dark field exposures

Image Number 6 for United States Patent #8133659.

This invention provides methods of creating via or trench structures on a developer-soluble hardmask layer using a multiple exposure-development process. The hardmask layer is patterned while the imaging layer is developed. After the imaging layer is stripped using organic solvents, the same hardmask can be further patterned using subsequent exposure-development processes. Eventually, the pattern can be transferred to the substrate using an etching process.

  Recently Added Patents
Nitrogen-doped carbon-supported cobalt-iron oxygen reduction catalyst
Secure data entry device
Cucumber plants with a compact growing habit
Electronic system auto-mute control circuit and control method thereof
Method, system, and computer program product for scoring theoretical peptides
Semiconductor device and method for manufacturing the same
Plural component proportioner
  Randomly Featured Patents
Ceiling fan and light fixture
Modified conjugated diene-vinyl aromatic copolymer and method for manufacturing the same
Handheld voting device
High speed rotary atomizers
Machine for withdrawing bread slices or like products from a continuous cycle belt-type baking oven, and presenting them in a horizontal stack
Dual-voltage electric hair curling apparatus and vanity case therefore
Apparatus for producing polymers having a wide molecular weight distribution
Tire vulcanizing machine
Electrostatic imaging apparatus
Paper shredder