Resources Contact Us Home
On-track process for patterning hardmask by multiple dark field exposures

Image Number 6 for United States Patent #8133659.

This invention provides methods of creating via or trench structures on a developer-soluble hardmask layer using a multiple exposure-development process. The hardmask layer is patterned while the imaging layer is developed. After the imaging layer is stripped using organic solvents, the same hardmask can be further patterned using subsequent exposure-development processes. Eventually, the pattern can be transferred to the substrate using an etching process.

  Recently Added Patents
Personalized health communication system
Liquid crystal display device
Mobile communication apparatus
Method of providing user-tailored entertainment experience at hospitality location and hospitality media system thereof
Method and arrangement for controlling semiconductor component
Data processing apparatus, activation control method, and computer-readable storage medium
Vending machine
  Randomly Featured Patents
Aroma composition containing alpha-acetolactic acid
Method for analyzing physical properties of materials
Ivory-colored zirconia sintered body, process for its production and its use
Media tabbing apparatus and method
Aqueous electrocoating composition of the reaction product of an epoxy ester resin and a maleinized drying oil blended with a cross-linking agent
Multi-blade pencil-core sharpener
Optical recording medium, recording, and reproduction apparatus having multiple recording capacity features
Method to transfer information between data storage devices
Cathode ray tube having a frame/mask assembly
Method and apparatus for re-authentication of a computing device using cached state