Resources Contact Us Home
Photo nanoimprint lithography

Image Number 9 for United States Patent #8133427.

The present invention is directed to providing a photo nanoimprint lithography which can form a more uniform base layer. A photo nanoimprint lithography according to the present invention includes the steps of discretely applying a photo-curable resist drop-wise onto a substrate, filling an asperity pattern of a mold with the photo-curable resist by bringing the mold having the asperity pattern formed therein into contact with the photo-curable resist, curing the photo-curable resist by irradiating the resist with a light and releasing from the mold the photo-curable resist which has been photo-cured, wherein an intermediary layer is formed on a surface of the substrate for maintaining a discrete placement of the photo-curable resist that has been instilled drop-wise on the substrate until the mold is brought into contact with the photo-curable resist that has been instilled drop-wise on the substrate.

  Recently Added Patents
Method for generating codewords
Method and system for distributing ringback files
Disk-based storage device having read channel memory that is selectively accessible to disk controller
Lightweight multicast method and apparatus for data distribution service
Managing aging of silicon in an integrated circuit device
Process cartridge and electrophotographic image forming apparatus
Apparatus and method for adapted deblocking filtering strength
  Randomly Featured Patents
Multiple use rotary cutting device
Invalid transfer arrangement
Methods for diabetes susceptibility assessment in asymptomatic patients
Current cell of a digital-to-analog converter
System of reconfigurable pipelines of generalized neighborhood function morphic image processors
Biodegradable expanded foam material
Optical arrangement for detecting the intensity modulation of partial ray beams
Method for forming an image
Never-busy facsimile service
Underlayer compositions for multilayer lithographic processes