Resources Contact Us Home
Photo nanoimprint lithography

Image Number 9 for United States Patent #8133427.

The present invention is directed to providing a photo nanoimprint lithography which can form a more uniform base layer. A photo nanoimprint lithography according to the present invention includes the steps of discretely applying a photo-curable resist drop-wise onto a substrate, filling an asperity pattern of a mold with the photo-curable resist by bringing the mold having the asperity pattern formed therein into contact with the photo-curable resist, curing the photo-curable resist by irradiating the resist with a light and releasing from the mold the photo-curable resist which has been photo-cured, wherein an intermediary layer is formed on a surface of the substrate for maintaining a discrete placement of the photo-curable resist that has been instilled drop-wise on the substrate until the mold is brought into contact with the photo-curable resist that has been instilled drop-wise on the substrate.

  Recently Added Patents
System, method and program recording medium for supply capacity estimation
Pattern transfer apparatus and method for fabricating semiconductor device
Display apparatus
Avalanche photo diode and method of manufacturing the same
Newly identified human rhinovirus of HRV-C and methods and kits for detecting HRV-Cs
Method and apparatus for controlling cardiac resynchronization therapy using cardiac impedance
  Randomly Featured Patents
Thermal recording apparatus and erasing method of a record therefor
Duration estimation of repeated directed graph traversal
Method of forming semiconductor compound film for fabrication of electronic device and film produced by same
Process for producing antistatic, fabric-softening detergent composition
Compressed air respirator
Ported loudspeaker enclosure
Piperidine derivatives and process for their production
Ultra dense dram cell and its method of fabrication
Helical endocardial catheter probe
Impact modified polyamide compositions