Resources Contact Us Home
Photo nanoimprint lithography

Image Number 9 for United States Patent #8133427.

The present invention is directed to providing a photo nanoimprint lithography which can form a more uniform base layer. A photo nanoimprint lithography according to the present invention includes the steps of discretely applying a photo-curable resist drop-wise onto a substrate, filling an asperity pattern of a mold with the photo-curable resist by bringing the mold having the asperity pattern formed therein into contact with the photo-curable resist, curing the photo-curable resist by irradiating the resist with a light and releasing from the mold the photo-curable resist which has been photo-cured, wherein an intermediary layer is formed on a surface of the substrate for maintaining a discrete placement of the photo-curable resist that has been instilled drop-wise on the substrate until the mold is brought into contact with the photo-curable resist that has been instilled drop-wise on the substrate.

  Recently Added Patents
Manufacturing aircraft parts
Method and apparatus for disease diagnosis and screening using extremely low frequency electromagnetic fields
Plasma doping method and plasma doping apparatus
Method and system for cooling of integrated circuits
Sensor system
Valved, microwell cell-culture device and method
RF/optical shared aperture for high availability wideband communication RF/FSO links
  Randomly Featured Patents
Christmas tree watering system
Method for computer-aided mapping
Recording sheets
Auxiliary wood burning furnace
Glass-ceramic and a process for obtaining it
Print head drive scheme
Additive for, treatment fluid for, and method of plugging a tubing/casing annulus in a well bore
Suspended ceiling sign
Low chamfer angled torque tube end fitting with elongated overflow groove
Dye substituted cyclic 1,3-sulfur-nitrogen compounds as dye image-forming materials in photography