Resources Contact Us Home
Exposure apparatus and device manufacturing method

Image Number 14 for United States Patent #8130360.

An exposure apparatus includes an image sensor, a measurement optical system configured to guide measurement light to obliquely enter the projection optical system, and further, to guide the measurement light returned from the projection optical system to the image sensor, and a control unit configured to calculate surface position information of the substrate based on the output from the image sensor. The control unit calculates the surface position information of the substrate based on an interval between the image, of a mark arranged on the original stage, formed by the measurement light, which has passed through the mark, and the image of the mark formed by the measurement light reflected by the mark.

  Recently Added Patents
Hydrostatic pad pressure modulation in a simultaneous double side wafer grinder
Decontamination apparatus and method
Device for determining the absolute angular position of the steering wheel of an electric power-assisted steering column of a motor vehicle using weighted dynamic parameters of the vehicle
Measuring device and measuring method that use pulsed electromagnetic wave
Semiconductor device and method of forming discontinuous ESD protection layers between semiconductor die
Large carrying case
  Randomly Featured Patents
Variable volume drain field system
Spinning preparations in the form of aqueous emulsions or aqueous solutions containing polymers
Lift bed
Hydrodynamic and supportive structure for gated ship stern
Housing for an electronic circuit board
Apparatus and method for boosting sound in a denta-mandibular sound-transmitting entertainment toothbrush
Thin-film resistor and method of manufacturing the same
Towel retaining device and pillow
Parallel migration of data between systems
Built-in self test for content addressable memory