Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Exposure apparatus and device manufacturing method










Image Number 14 for United States Patent #8130360.

An exposure apparatus includes an image sensor, a measurement optical system configured to guide measurement light to obliquely enter the projection optical system, and further, to guide the measurement light returned from the projection optical system to the image sensor, and a control unit configured to calculate surface position information of the substrate based on the output from the image sensor. The control unit calculates the surface position information of the substrate based on an interval between the image, of a mark arranged on the original stage, formed by the measurement light, which has passed through the mark, and the image of the mark formed by the measurement light reflected by the mark.








 
 
  Recently Added Patents
Charged-particle beam lens
Plants and seeds of hybrid corn variety CH424126
Television apparatus
Extreme ultraviolet light source device and method for generating extreme ultraviolet light
Managing job execution
Semiconductor device
Method for determining the local position of at least one mobile radio communication device based on predetermined local positions of adjacent radio communication devices, associated radio com
  Randomly Featured Patents
Method of automating place and route corrections for an integrated circuit design from physical design validation
Quasi-static inverter circuit
Semiconductor memory device
Roller winding machine for the formation of single reels
Latching mechanism for seat assembly
Facedriver for miniature workpieces
Thermally stabilized polyetherimides
Electrostatic latent image developing device
Methods and compositions for the treatment and diagnosis of shipping fever
Spacer grid for dual-cooling nuclear fuel rods using intersectional support structures