Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Exposure apparatus and device manufacturing method










Image Number 14 for United States Patent #8130360.

An exposure apparatus includes an image sensor, a measurement optical system configured to guide measurement light to obliquely enter the projection optical system, and further, to guide the measurement light returned from the projection optical system to the image sensor, and a control unit configured to calculate surface position information of the substrate based on the output from the image sensor. The control unit calculates the surface position information of the substrate based on an interval between the image, of a mark arranged on the original stage, formed by the measurement light, which has passed through the mark, and the image of the mark formed by the measurement light reflected by the mark.








 
 
  Recently Added Patents
Light emitting device
Forming agent for gate insulating film of thin film transistor
Method and apparatus for increasing query traffic to a web site
Method and system for coding an information signal using closed loop adaptive bit allocation
Markers of acute myeloid leukemia stem cells
Aisle barrier
Fabrication method of semiconductor device and fabrication method of dynamic threshold transistor
  Randomly Featured Patents
Expansible plug for anchoring to a building component
Cellular structure plate
Electrically conductive polymer compositions
Metal vapour condensation and liquid metal withdrawal
Liquid ejection head and image recording apparatus
DNA sequences that encode a natural resistance to infection with intracellular parasites
Two-way radio having a PLL
Carpet cutting device
Checkerboard buffer using memory blocks
Heat-developable photosensitive material