Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Exposure apparatus and device manufacturing method










Image Number 14 for United States Patent #8130360.

An exposure apparatus includes an image sensor, a measurement optical system configured to guide measurement light to obliquely enter the projection optical system, and further, to guide the measurement light returned from the projection optical system to the image sensor, and a control unit configured to calculate surface position information of the substrate based on the output from the image sensor. The control unit calculates the surface position information of the substrate based on an interval between the image, of a mark arranged on the original stage, formed by the measurement light, which has passed through the mark, and the image of the mark formed by the measurement light reflected by the mark.








 
 
  Recently Added Patents
Mounting structure, electro-optical apparatus, and touch panel
Method and system for providing cloud based network security services
Fuel basket spacer, apparatus and method using the same for storing high level radioactive waste
Hybrid CMOS nanowire mesh device and PDSOI device
Process for preparing MDA via the stage of the aminal
Optical disc drive having a tray for loading a disc using supporting portions
Method and system for efficient DRX operation during handover in LTE
  Randomly Featured Patents
Flow balancing and synchronization system and method, especially for citrate
Acoustically-powered wireless defibrillator
Method for determining positions of points to be measured
Toner container
Sprue bushing and method of manufacture
Putter head
Content addressable memory with programmable word width and programmable priority
Apparatus and method for joining fabrics without sewing
Exhaust silencer, especially for small vehicles
Device for intercepting and collecting liquid media from ascending gaseous carriers