Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Exposure apparatus and device manufacturing method










Image Number 14 for United States Patent #8130360.

An exposure apparatus includes an image sensor, a measurement optical system configured to guide measurement light to obliquely enter the projection optical system, and further, to guide the measurement light returned from the projection optical system to the image sensor, and a control unit configured to calculate surface position information of the substrate based on the output from the image sensor. The control unit calculates the surface position information of the substrate based on an interval between the image, of a mark arranged on the original stage, formed by the measurement light, which has passed through the mark, and the image of the mark formed by the measurement light reflected by the mark.








 
 
  Recently Added Patents
Optical recording medium, and method for producing optical recording medium
Dye sensitised solar cell
Plants and seeds of hybrid corn variety CH336383
Launch cable case
Method and system for reduction of decoding complexity in a communication system
Horse stationary tab
Compact semiconductor memory device having reduced number of contacts, methods of operating and methods of making
  Randomly Featured Patents
EER modulator with power amplifier having feedback loop providing soft output impedance
Method for preventing dopant diffusion in dual gate device
Coated optical fibers
Method of making tube-to-plate connection
In-plane switching liquid crystal display with an alignment free structure and method of using back exposure to form the same
Proximal anchors for bone fixation system
Maize variety hybrid X13B597
Switching system service controller operating in a closed loop with call processor using subscriber-specific scheduling memories
Vibration-sound generating device and yoke thereof
Reinforced silt retention sheet