Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Exposure apparatus and device manufacturing method










Image Number 14 for United States Patent #8130360.

An exposure apparatus includes an image sensor, a measurement optical system configured to guide measurement light to obliquely enter the projection optical system, and further, to guide the measurement light returned from the projection optical system to the image sensor, and a control unit configured to calculate surface position information of the substrate based on the output from the image sensor. The control unit calculates the surface position information of the substrate based on an interval between the image, of a mark arranged on the original stage, formed by the measurement light, which has passed through the mark, and the image of the mark formed by the measurement light reflected by the mark.








 
 
  Recently Added Patents
Knee guard
Wireless communication system and wireless communication method
Latch-up free ESD protection
Light fixture
Systems and methods for arranging and labeling cardiac episodes
Systems and methods for velocity profile based approach to point control
Modification of an object replica
  Randomly Featured Patents
Fractionation for a C.sub.6 paraffin isomerization process
Recording medium containing supplementary service information for Audio/Video contents, and method and apparatus of providing supplementary service information of the recording medium
Managing latencies in accessing memory of computer systems
Stacked level shifter method and apparatus
Chain skirt
Device and method of reducing junction leakage
Method and system for predictive physiological gating of radiation therapy
Multi-processor using shared buses
Transmission line directional coupling
Laminated grid and web magnetic cores