Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Double patterning process










Image Number 9 for United States Patent #8129099.

Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant, coating a second resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a second positive resist pattern. The last development step includes dissolving away the reversed first resist pattern and achieving reversal transfer.








 
 
  Recently Added Patents
Fuel cell module
Advertising apparatus
Servomotor control circuit
Method and apparatus for eliminating a motor vehicle tip-over risk
Analysis of stress impact on transistor performance
Analyte assaying by means of immunochromatography with lateral migration
Heterocyclic compounds as CCR2B antagonists
  Randomly Featured Patents
Shoe sole
Anti-CD19 antibodies
Motorcycle fork
Over write capable magnetooptical recording medium
Configurable rating system for a telecommunications service provider
DNA encoding sterol methyltransferase
Spout hub
Suction head for an apparatus for sucking fluid media
Methods for monitoring or controlling the ratio of hydrogen to water vapor in metal heat treating atmospheres
Dual reference voltage input receiver for high speed data transmission