Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Double patterning process










Image Number 8 for United States Patent #8129099.

Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant, coating a second resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a second positive resist pattern. The last development step includes dissolving away the reversed first resist pattern and achieving reversal transfer.








 
 
  Recently Added Patents
Power semiconductor devices and methods
Microphone
Docking terminal and system for controlling vehicle functions
3D authoring tool ensuring no buffer underrun upon jumps
Object detection to determine road priority
Fluorosulfonates
Image synchronization for multiple displays
  Randomly Featured Patents
Artificial granite solid material
Semiconductor device
Wheel
Rotary internal combustion engine
Eyeglasses with integrated rear view mirrors
Device for steering a conveyor belt
Cake slicer
Bar end separator
Method for applying coating to paper web including successive doctoring steps
Method and apparatus to evaluate dielectrically-anisotropic materials using analysis of multiple microwave signals in different planes of polarization