Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Double patterning process










Image Number 8 for United States Patent #8129099.

Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant, coating a second resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a second positive resist pattern. The last development step includes dissolving away the reversed first resist pattern and achieving reversal transfer.








 
 
  Recently Added Patents
Link establishment in a wireless communication environment
Cylindrical LED fixture
Method of preparing MgB.sub.2 superconducting wire and the MgB.sub.2 superconducting wire prepared thereby
Look up table (LUT) structure supporting exclusive OR (XOR) circuitry configured to allow for generation of a result using quaternary adders
Method of purifying crude acetone stream
Prevention and treatment of osteoarthritis
Method and receiver for jointly decoding received communication signals using maximum likelihood detection
  Randomly Featured Patents
Ink-jet type image forming apparatus
Optomagnetic recording, reading and erasing method and implementing apparatus which permits overwriting of previously recorded information
Squeak prevention for disc brake
Re-fetching cache memory enabling low-power modes
Dry etching method, fabrication method for semiconductor device, and dry etching apparatus
Quick-release bicycle axle fastener nut
Chuck with triaxial construction
Pre-distortion apparatus and method thereof
Connector
Medical pumping apparatus