Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Double patterning process










Image Number 8 for United States Patent #8129099.

Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant, coating a second resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a second positive resist pattern. The last development step includes dissolving away the reversed first resist pattern and achieving reversal transfer.








 
 
  Recently Added Patents
Process for producing polyols
Programming method of non-volatile memory device
Nonaqueous secondary battery with nitrile group-containing compound
Blend polymer gas separation membrane
Computer device with digitizer calibration system and method
Mixture, especially spinning solution
Nonvolatile semiconductor memory device and method for controlling the same
  Randomly Featured Patents
Cable splice closure
Optical devices and methods for measuring samples
Phosphating solution and method for conversion treating surface of magnesium alloy workpiece
Fluxless bumping process
Pressure-relief valve of a housing for an electrical/electronic unit
Multiple filter vessel
Phase lock loop circuit with variable loop gain
Bracket assembly for carrying signage for a retail display fixture
Co-inverter apparatus
Plug valve