Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Double patterning process










Image Number 4 for United States Patent #8129099.

Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant, coating a second resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a second positive resist pattern. The last development step includes dissolving away the reversed first resist pattern and achieving reversal transfer.








 
 
  Recently Added Patents
Semiconductor device having a multilevel interconnect structure and method for fabricating the same
Expression of dirigent gene EG261 and its orthologs and paralogs enhances pathogen resistance in plants
Vehicle wheel
Method and apparatus for over-the-air activation of neighborhood cordless-type services
Ranging method and apparatus in passive optical network
Techniques for image segment accumulation in document rendering
Array substrate including thin film transistor and method of fabricating the same
  Randomly Featured Patents
Device for tensioning pre-stress bars and for determining this tension
Differential pressure gauge
Bis-naphthalimides as anticancer agents
Television set
Castable umbrella rig with interchangeable wire harness
Structural element having a metal wall of generally tubular shape
Sidewise channeled projectile for sidewise advance during rotation around its length
Mounting attachment
Display screen control apparatus
Carbazole-containing materials in phosphorescent light emitting diodes