Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Double patterning process










Image Number 4 for United States Patent #8129099.

Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant, coating a second resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a second positive resist pattern. The last development step includes dissolving away the reversed first resist pattern and achieving reversal transfer.








 
 
  Recently Added Patents
Pixel circuit
Self-correcting amplifier system
Gemstone
Canine iPS cells and method of producing same
Methods and apparatus for dynamic identification (ID) assignment in wireless networks
Multipoint photonic doppler velocimetry using optical lens elements
Methods of producing the membranes and the uses of membranes as battery separator films
  Randomly Featured Patents
Inhalation actuated device
Exposure control apparatus
Optical scanning apparatus incorporating counter-rotation of elements about a common axis by a common driving source
Managing secure sessions
Supercurrent bifilar twister
Medium-handling in printer for donor and receiver mediums
Information transmission system for transmitting information among terminals different in modulation/demodulation techniques and method used therein
Vehicle headlamp reflector with extension and step imitating surfaces
Inter-program synchronous communications using a collaboration software system
Force sensor