Resources Contact Us Home
Double patterning process

Image Number 4 for United States Patent #8129099.

Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant, coating a second resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a second positive resist pattern. The last development step includes dissolving away the reversed first resist pattern and achieving reversal transfer.

  Recently Added Patents
Blast-resistant vehicle hull
Scanning systems
Power-saving control apparatus and method
Materials, systems and methods for optoelectronic devices
On-chip interconnects VIAS and method of fabrication
Method of treating a formation
Navigation device and traffic line display method
  Randomly Featured Patents
Hydraulic motor system for driving a submersible impeller pump in which hydraulic surge at start-up and shut-down is cushioned
Lithium secondary battery, and process for producing the same
X-ray imaging detector with limited substrate and converter
Integrated electrically operable micro-valve
Method and apparatus for aerating
Tape-out form generation methods and systems
Resilient animal throw-toy with buoyant interior member
Apparatus and method for optimizing descendant path evaluation in xpath/xquery
Epoxy polysiloxane coating and flooring compositions
Premagnetization process for printing longitudinal media