Resources Contact Us Home
Double patterning process

Image Number 4 for United States Patent #8129099.

Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant, coating a second resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a second positive resist pattern. The last development step includes dissolving away the reversed first resist pattern and achieving reversal transfer.

  Recently Added Patents
Biaxially oriented hydrolysis-stable polyester film comprising epoxidized fatty acid derivatives and a chain extender, and process for production thereof and use thereof
Compounds, compositions and methods for reducing lipid levels
Display screen with graphical user interface
Nickel-cobalt-manganese multi-element lithium ion battery cathode material with dopants and its methods of preparation
Generating a network map
Substrate processing apparatus and display method of substrate processing apparatus
Supporting multiple channels of a single interface
  Randomly Featured Patents
Method of operating an electromagnetic arrangement
Integrated circuit card holder
Camera capable of being held stably
Method of combining ducted fan gas turbine engine modules and aircraft structure
Method, apparatus and computer program product for data mining having user feedback mechanism for monitoring performance of mining tasks
Image forming apparatus utilizing both a transfer belt and a direct transfer member
Gear drive
Breakdown-tiggered transient discharge circuit
Convertible roof actuation mechanism
Blue flame burner