Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Double patterning process










Image Number 4 for United States Patent #8129099.

Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant, coating a second resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a second positive resist pattern. The last development step includes dissolving away the reversed first resist pattern and achieving reversal transfer.








 
 
  Recently Added Patents
Plants and seeds of corn variety CV335662
Telephone relaying apparatus, telephone relaying method, and program
Tomlinson Harashima precoding with additional receiver processing in a multi-user multiple-input multiple-output wireless transmission system
Grid computing accounting and statistics management system
Catalysts for hydrodeoxygenation of polyols
Dynamic allocation of access channels based on access channel occupancy in a cellular wireless communication system
Battery module
  Randomly Featured Patents
System for diagnosing sensors to find out abnormality therein
Method and apparatus for implementing fault tolerant phase locked loop (PLL)
Optical probe
Transport case
Electrolyte content w/o emulsions for treating irritated/sensitive skins
Spread-spectrum modulation methods and circuit for clock generator phase-locked loop
Inbred corn plant 09DSQ1 and seeds thereof
Chemically-resistant shelter coating
Liquid crystal display
Methods and apparatus for auto image binarization