Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Double patterning process










Image Number 4 for United States Patent #8129099.

Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant, coating a second resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a second positive resist pattern. The last development step includes dissolving away the reversed first resist pattern and achieving reversal transfer.








 
 
  Recently Added Patents
Newly identified human rhinovirus of HRV-C and methods and kits for detecting HRV-Cs
Vending machine
Synthesis of amines and intermediates for the synthesis thereof
Laser receiver for detecting a relative position
Music composition automation including song structure
Adaptive switch mode LED system
Image processing apparatus and image processing method
  Randomly Featured Patents
Polarized light illumination device
TH type tape rule
Production of resist images, and a suitable dry film resist
Brushless dynamo electric machine with access to rectifier assembly
Semiconductor manufacturing non-processing apparatuses with storage equipment
Data carousel receiving and caching
Liquid level sensor for buffered hydrofluoric acid
Process for preventing or remediating trithiazine deposition in high H.sub.2S wells
Phacoemulsification/irrigation and aspiration sleeve apparatus
Tablet filling instrument