Resources Contact Us Home
Method for manufacturing a semiconductor device

Image Number 5 for United States Patent #8129094.

A spacer is formed on side and top portions of a photoresist pattern after a mask process is performed so that the spacer may be used as an etching mask. The spacer is formed using a polymer deposition layer which is a low temperature oxide or nitride that can be deposited on side and top portions of the photoresist pattern at C. after the mask process is performed. A method for manufacturing a semiconductor device includes forming a bottom anti-reflection coating film on an etch-target layer, patterning a photoresist layer formed on the bottom anti-reflection coating film, forming an insulation layer on a patterned photoresist layer and the bottom anti-reflection coating film, etching back the insulation layer to form a spacer on sidewalls of the patterned photoresist layer, and etching the bottom anti-reflection coating film and the etching target layer exposed by the spacer to form a fine pattern.

  Recently Added Patents
Video data recording device, video data playing device, video data recording method, and video data playing method
Optical line terminal
Task management in a workforce environment using an acoustic map constructed from aggregated audio
Reconfigurable keyfield on a communication device
Building and using predictive models of current and future surprises
Information technology configuration management
Mixed-metal system conductors for LTCC (low-temperature co-fired ceramic)
  Randomly Featured Patents
Device for detecting quality alterations in bulk goods transported on moving belt conveyors
Mechanism for supporting expandable pouch of luggage
Flame ionization detector
Lamp assembly
Vacuum cleaner and temperature-responsive motor cooling device
Process for monomethyl acyclic hydrocarbon adsorptive separation
Nonmetallic dental post and method
Method for the transfer of data flow of digital images and digital detection unit
Article receiving and detection apparatus and method therefore
Apparatus for stabilizing plaster