Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for manufacturing a semiconductor device










Image Number 5 for United States Patent #8129094.

A spacer is formed on side and top portions of a photoresist pattern after a mask process is performed so that the spacer may be used as an etching mask. The spacer is formed using a polymer deposition layer which is a low temperature oxide or nitride that can be deposited on side and top portions of the photoresist pattern at 75.about.220.degree. C. after the mask process is performed. A method for manufacturing a semiconductor device includes forming a bottom anti-reflection coating film on an etch-target layer, patterning a photoresist layer formed on the bottom anti-reflection coating film, forming an insulation layer on a patterned photoresist layer and the bottom anti-reflection coating film, etching back the insulation layer to form a spacer on sidewalls of the patterned photoresist layer, and etching the bottom anti-reflection coating film and the etching target layer exposed by the spacer to form a fine pattern.








 
 
  Recently Added Patents
Login security with short messaging
Method to quantify siRNAs, miRNAs and polymorphic miRNAs
System and methods for weak authentication data reinforcement
Polishing composition
Method for cutting C--Mn steel with a fiber laser
Apparatus and method of preventing signal delay in display device
O-space imaging: highly efficient parallel imaging using complementary nonlinear encoding gradient fields and receive coil geometries
  Randomly Featured Patents
Nucleotide sequencing via repetitive single molecule hybridization
Blended amino functional siloxane release agents for fuser members
Thermoplastic composite lumber having reinforcing laminate of unidirectional fibers
Frame synchronization and fault protection for a telecommunications device
Electrolysis cell for reprocessing plutonium reactor fuel
Transferset for vials and other medical containers
Tagged pyroglu-L-Phe-L-Arg derivatives, substrates and assays for kallikrein
Use of an alloying element to form a stable oxide layer on the surface of metal features
Method for engineering a control system
Gas-liquid contacting apparatus