Resources Contact Us Home
Method for manufacturing a semiconductor device

Image Number 5 for United States Patent #8129094.

A spacer is formed on side and top portions of a photoresist pattern after a mask process is performed so that the spacer may be used as an etching mask. The spacer is formed using a polymer deposition layer which is a low temperature oxide or nitride that can be deposited on side and top portions of the photoresist pattern at C. after the mask process is performed. A method for manufacturing a semiconductor device includes forming a bottom anti-reflection coating film on an etch-target layer, patterning a photoresist layer formed on the bottom anti-reflection coating film, forming an insulation layer on a patterned photoresist layer and the bottom anti-reflection coating film, etching back the insulation layer to form a spacer on sidewalls of the patterned photoresist layer, and etching the bottom anti-reflection coating film and the etching target layer exposed by the spacer to form a fine pattern.

  Recently Added Patents
Downlink scheduling in fractional frequency reuse (FFR) systems
Method of manufacturing pipe with branch
Electrical event detection device and method of detecting and classifying electrical power usage
Processes for producing polyunsaturated fatty acids in transgenic organisms
Architecture, system and method for testing resistive type memory
High density molecular memory storage with read and write capabilities
Methods and apparatus for deactivating internal constraint curves when inflating an N-sided patch
  Randomly Featured Patents
Mostly exclusive shared cache management policies
Method for transporting boards, load port apparatus, and board transport system
Sleeve for insulating electric terminal
Clear glass composition
Voltage multiplier circuits or the like
Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application
Method for calibrating a laser-based spherical coordinate measurement system by a mechanical harmonic oscillator
Isomaltooligosaccharides from Leuconostoc as neutraceuticals
Device for treating teeth
Pattern forming method, pattern forming apparatus, and device manufacturing method