Resources Contact Us Home
Prevention of photoresist scumming

Image Number 3 for United States Patent #8129093.

A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist scumming. An increased acid layer beneath the resist prevents acid diffusion. In one embodiment, the increased acid layer is a layer of spun-on acid or PAG dissolved in aqueous solution. In another embodiment, the increased acid layer is a hard mask material with a PAG or an acid mixed into the material. The high acid content inhibits the diffusion of acid from the photoresist into neighboring layers, and thus substantially reduces photoresist scumming and footing.

  Recently Added Patents
Methods and systems for managing print device supplies using cloud administration system configured for chemical signature tracking
Hermetically sealed atomic sensor package manufactured with expendable support structure
Clostridium chauvoei polypeptide, DNA encoding the polypeptide and a vaccine comprising the polypeptide
Determination and presentation of package pricing offers in response to customer interest in a product
Authenticated secret sharing
Ionization device, mass spectrometer including the ionization device, and image generation system including the ionization device
Rose plant named `ESM R057`
  Randomly Featured Patents
Input method for surface of interactive display
Ethylene recovery in direct-oxidation ethylene oxide processes
Separating phenols from alkaline pulping spent liquors
Flexible shroud for exercise equipment
Surfboard type boat convertible into sailboat or buoy
Material composition analyzer and method
Fixing and/or supporting device for a circuit board
Pianoharp action
Near-field optical probe for reproducing information on a recording medium using near-field light
Force sensor with angled coupling