Resources Contact Us Home
Prevention of photoresist scumming

Image Number 3 for United States Patent #8129093.

A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist scumming. An increased acid layer beneath the resist prevents acid diffusion. In one embodiment, the increased acid layer is a layer of spun-on acid or PAG dissolved in aqueous solution. In another embodiment, the increased acid layer is a hard mask material with a PAG or an acid mixed into the material. The high acid content inhibits the diffusion of acid from the photoresist into neighboring layers, and thus substantially reduces photoresist scumming and footing.

  Recently Added Patents
Method and apparatus for secure transfer and playback of multimedia content
Malicious attack detection and analysis
Remotely provisioned wireless proxy
Integrated transmit/receive switch
Asymmetric switching rectifier
Sensor chip, sensor cartridge, and analysis apparatus
Radio communication system, transmission apparatus, reception apparatus, and radio communication method in radio communication
  Randomly Featured Patents
Conveyor system
Epitaxial wafer device including an active layer having a two-phase structure and light-emitting device using the wafer
Barrier/liner with a SiNx-enriched surface layer on MOCVD prepared films
Image forming method
Faucet assembly
Shock-proof device of external hard disk driver box
Radiation sensitive resin composition
Grid tee for suspension ceilings or the like
Piston for an internal combustion engine