Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Prevention of photoresist scumming










Image Number 3 for United States Patent #8129093.

A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist scumming. An increased acid layer beneath the resist prevents acid diffusion. In one embodiment, the increased acid layer is a layer of spun-on acid or PAG dissolved in aqueous solution. In another embodiment, the increased acid layer is a hard mask material with a PAG or an acid mixed into the material. The high acid content inhibits the diffusion of acid from the photoresist into neighboring layers, and thus substantially reduces photoresist scumming and footing.








 
 
  Recently Added Patents
Factor IXa crystals, related complexes and methods
Differentiated PSIP table update interval technology
Method and apparatus for providing contention-based resource zones in a wireless network
Chip on chip semiconductor device including an underfill layer having a resin containing an amine-based curing agent
Wireless device with extendable antenna
Biometric data display system and method
Connector with shielding device and method for manufacturing connector
  Randomly Featured Patents
Stacked ESD protection
13,14-Dihydro-inter-oxa-11-deoxy-9-deoxy-9-methylene-19-oxo-PFG.sub.1 compounds
Circular fluorescent lamp unit
Catalyst-mediated in-situ generation of dioxirane
Method for measuring refractive power and apparatus therefor
Chair
Loudspeaker apparatus
Electrode material and electrode for III-V group compound semiconductor
Method and apparatus for preparing a liquid sample
Call admission control within a wireless network