Resources Contact Us Home
Prevention of photoresist scumming

Image Number 3 for United States Patent #8129093.

A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist scumming. An increased acid layer beneath the resist prevents acid diffusion. In one embodiment, the increased acid layer is a layer of spun-on acid or PAG dissolved in aqueous solution. In another embodiment, the increased acid layer is a hard mask material with a PAG or an acid mixed into the material. The high acid content inhibits the diffusion of acid from the photoresist into neighboring layers, and thus substantially reduces photoresist scumming and footing.

  Recently Added Patents
Method for specifying control curve parameters for controlling climatic environmental conditions of climate-controlled enclosed spaces
Magnetic recording medium, information storage device, and method of manufacturing magnetic recording medium
Precision geolocation of moving or fixed transmitters using multiple observers
Wafer processing method and system using multi-zone chuck
Upstream channel bonding in a cable communications system
Interleaving charge pumps for programmable memories
System and method for reducing the risks involved in trading multiple spread trading strategies
  Randomly Featured Patents
Low-temperature chemical vapor deposition of low-resistivity ruthenium layers
Blocking pre-amorphization of a gate electrode of a transistor
Active matrix substrate and active matrix display apparatus
Foamed thermoplastic polyurethanes
Tire pump
Medical alert key tag
Computer system where giving and receiving a data between programs are controlled
Manufacture of vicinal glycol esters from synthesis gas
Device for operating a piezo actuator