Resources Contact Us Home
Variable resist protecting groups

Image Number 14 for United States Patent #8129080.

A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process.

  Recently Added Patents
Systems and methods for controlling phasing of advancing substrates in absorbent article converting lines
Reactor core of liquid metal cooled reactor
Packet transmission system and fault recovery method
Single-wavelength correction method for luminescent homogeneous biological assay
Method and device for reliable estimation of network traffic
Verifiable service policy implementation for intermediate networking devices
Identification of biomarkers in biological samples and methods of using same
  Randomly Featured Patents
Ion implanted substrate having capping layer and method
Thin film transistor and fabricating method thereof
Moving picture recording and reproduction apparatus and method as well as medium
Downhole retrieval tool
Air purifier
Stripper device for guide tracks on tool machines
Continuous plane of thin-film materials for a two-terminal cross-point memory
Method for incorporating processing additives in polyvinyl chloride resins and additive concentrate for use therein
Methods and apparatus for reducing seal teeth wear
Lumbar support