Resources Contact Us Home
Variable resist protecting groups

Image Number 14 for United States Patent #8129080.

A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process.

  Recently Added Patents
Workflow-enabled client
Encoding method, decoding method, encoding device, decoding device, program, and recording medium
Hand mixer
Method, apparatus, and system for energy efficiency and energy conservation including dynamic cache sizing and cache operating voltage management for optimal power performance
3D image generating method, 3D animation generating method, and both 3D image generating module and 3D animation generating module thereof
Nanogap device for field enhancement and a system for nanoparticle detection using the same
Compositions for inhibiting NADPH oxidase activity
  Randomly Featured Patents
Tree-removing device
System for smoothing output voltage of power generator
Communication apparatus, communication system, and communication method
Air compression variable heating system
Diffuser for an arc discharge lamp
2-carboxamide cycloamino ureas
Electron gun assembling apparatus and method of assembling electron gun
Ferrous metal body coated with an alloy formed by an iron/silicon extended molybdenum plasma spray powder
Multi-head embroidery machine
Universal vibratory roller unit