Resources Contact Us Home
Variable resist protecting groups

Image Number 14 for United States Patent #8129080.

A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process.

  Recently Added Patents
Vehicle tail lamp
High electron mobility transistor and manufacturing method thereof
Techniques for forming a contact to a buried diffusion layer in a semiconductor memory device
Devices and methods for the production of coaxial microfibers and nanofibers
Display for gloves
Illumination unit for a direct-view display
  Randomly Featured Patents
Sound controllable apparatus particularly useful in controlling toys and robots
Aircraft collapsible fuel tank
Image forming apparatus
Singly terminated distributed amplifier
Apparatus for heating or cooling a polishing surface of a polishing apparatus
Bore welding device with worm drive and adjustable clamping spindle
Data recording medium and code reader
Stabilized zeolite A suspensions
Silver halide photographic material containing a compound capable of releasing a dye
High voltage power MOSFET having a voltage sustaining region that includes doped columns formed by trench etching and ion implantation