Resources Contact Us Home
Variable resist protecting groups

Image Number 14 for United States Patent #8129080.

A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process.

  Recently Added Patents
Wrench head
Printed wiring board with reinforced insulation layer and manufacturing method thereof
Reliable event broadcaster with multiplexing and bandwidth control functions
Content display system
Methods of forming semiconductor devices having diffusion regions of reduced width
Image signal processing apparatus and image signal processing method
System and method for routing streaming data requests
  Randomly Featured Patents
Adjustable cosmetic applicator
Use of molt-accelerating compounds, ecdysteroids, analogs thereof, and chitin synthesis inhibitors for controlling termites
Extrusion die and method for producing extrusion die for forming a honeycomb structure
Camera mount clamp
Desensitization of metastable intermolecular composites
Substituted alkylene diamine compounds
Methods and compositions for increasing feed intake of animals
High-frequency circuit, high-frequency device, and communication apparatus
Photodetector with a resonant cavity
Gaseous phase fluidized-bed reactor