Resources Contact Us Home
Variable resist protecting groups

Image Number 14 for United States Patent #8129080.

A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process.

  Recently Added Patents
LED lighting module
Laser processing method and apparatus
Meter socket cabinet
Medical imaging probe with rotary encoder
Television with a stand
Methods for increasing efficacy of FOLR1 cancer therapy
  Randomly Featured Patents
Semiconductor device and method of producing the same
Compositions corresponding to a proton-coupled peptide transporter and methods of making and using same
Reed spring relay construction
Input apparatus, portable electronic device and input method for a portable electronic device
Shaft straightening press with a traveling ram
Universal shaft and head connector
Cleaning solution for substrate for semiconductor device and process for producing substrate for semiconductor device
Methods of making sintered metal oxide articles
Using speech recognition to improve efficiency of an inventory task
Semiconductor device and fabrication method