Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
System and method for urodynamic evaluation utilizing micro electro-mechanical system technology










Image Number 6 for United States Patent #8128576.

An implantable urodynamic system includes an implantable first device deployable in a patient's bladder, an implantable second device deployable in a patient's vaginal canal, and a data acquisition and analysis module or processing unit external to the body of the patient. The first device includes a magnet and an inductive coil, and the second device includes a magnet, an inductive coil and a battery. When deployed in the patient's body, attraction between the magnets maintains the two devices in close proximity to one another to effect an inductive coupling between the coils so that the first device may be powered by the battery of the second device. The urodynamic system is intended to facilitate measurement, collection, and wireless transmission of real-time, or near real-time, data (bladder pressure, abdominal pressure, and temperature) from an ambulatory patient. This data is of value in diagnosing a number of abnormal bladder conditions, such as infection, overactive bladder, bladder spasms, and the like.








 
 
  Recently Added Patents
Method of requesting CQI reports
Wristband
Mechanisms for marking the orientation of a sawed die
Control system for shifting an automatic transmission
Calibration of quadrature imbalances using wideband signals
Wafer recycling method
Differentiated PSIP table update interval technology
  Randomly Featured Patents
Commit controlling scheme for transaction processing in system utilizing check point/roll back scheme
Osteoarthritis diet formulations
Capacitive strain sensor
Box
Sleep management method and system for improving sleep behaviour of a human or animal in the care of a carer
Apparatus and method for reducing redeposition in a physical vapor deposition system
Soybean cultivar 5656250112
Copper alloy having high electrical conductivity and high mechanical characteristics
Process for adjusting exposure masks relative to a substrate wafer
System and method for graphics data concurrency and coherency