Resources Contact Us Home
Coupling apparatus, exposure apparatus, and device fabricating method

Image Number 16 for United States Patent #8120751.

An exposure apparatus fills a space between a projection optical system and a substrate with a liquid and projects a pattern image onto the substrate to expose the substrate. The projection optical system has a first group including an optical member that comes into contact with the liquid, and a second group that differs from the first group. The first group is supported by a first support member via a vibration isolating apparatus.

  Recently Added Patents
Wafer level packaging structure with large contact area and preparation method thereof
Universal data-driven computer proxy
Method for specifying control curve parameters for controlling climatic environmental conditions of climate-controlled enclosed spaces
Method for transmitting an electronic short message to multiple receivers
Key management policies for cryptographic keys
Solar cell with hyperpolarizable absorber
Combined imaging and radiation therapy
  Randomly Featured Patents
Methods of cleaning treadmills
Synthesis of a diazido terminated energetic plasticizer
2-mercapto-imidazole derivatives substituted in position 4 (or 5) as antioxidizing agents, method of preparation and applications in the pharmaceutical, cosmetic or food industries
Process for applying low-cement castable refractory material
Brewing mechanism
Distributed secrets for validation of gaming transactions
Antagonist anti-CD40 antibodies
Multifunctional shovel attachment for an ice axe
Magnetic disk drive with a filter assembly capable of removing dust and toxic gases
Peer-to-peer group owner enhanced power management