Resources Contact Us Home
Drop pattern generation for imprint lithography

Image Number 5 for United States Patent #8119052.

Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement of a multiplicity of drops of substantially equal volume on an imprint lithography substrate such that some of the drops are substantially aligned with at least some of the features. The fluid drop pattern is generated through an optimization process. The fluid drop pattern allows substantially complete filling of imprinting surface features and formation of a substantially uniform residual layer during the imprint lithography process.

  Recently Added Patents
(Meth)acrylic resin composition, imidized (meth)acrylic resin composition, and film obtained by molding them
Photoelectric conversion module
Case of electronic device having antenna pattern embedded therein and mold and method for manufacturing the same
Permanent magnet axial field zeeman slower
Solid-state imaging device, method for manufacturing solid-state imaging device, and electronic apparatus
Method and system for associating a cell-sector with time-dependent location parameters
Method of manufacturing semiconductor devices using ion implantation
  Randomly Featured Patents
Process for producing sodium salts
Method for packing batches of products, packets or boxes in cartons divisible into several complete units
Intermixed line heights and blank line formation in a buffered printer
Self-encapsulated silver alloys for interconnects
System and method for whiteboard and audio capture
Portable, collapsible exercise machine
Automobile seat
Building construction steel having excellent fire resistance and low yield ratio
Method and apparatus for controlling intake air flow rate of an engine and method for controlling output