Resources Contact Us Home
Drop pattern generation for imprint lithography

Image Number 5 for United States Patent #8119052.

Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement of a multiplicity of drops of substantially equal volume on an imprint lithography substrate such that some of the drops are substantially aligned with at least some of the features. The fluid drop pattern is generated through an optimization process. The fluid drop pattern allows substantially complete filling of imprinting surface features and formation of a substantially uniform residual layer during the imprint lithography process.

  Recently Added Patents
Motor with power-generation coil module
Vehicle control apparatus
High-resolution, active reflector radio frequency ranging system
System and method for managing investment funds
Light powered hearing aid
Charge pump and method of biasing deep N-well in charge pump
Estrogen receptor ligands
  Randomly Featured Patents
Method for coating photoflash lamps
Inkjet printer having stably mounted printhead
Overhung axial flow compressor, reactor and method
Steering fluid device and method for increasing the angle of deflection of ink droplets generated by an asymmetric heat-type inkjet printer
Molding nonwoven, needle punched fabrics into three dimensional shapes
Internal assisted clutch
Printed circuit board base material
Backlight unit and display apparatus having the same
Current transformer cores formed from magnetic iron-based alloy including final crystalline particles and method for producing same