Resources Contact Us Home
Drop pattern generation for imprint lithography

Image Number 5 for United States Patent #8119052.

Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement of a multiplicity of drops of substantially equal volume on an imprint lithography substrate such that some of the drops are substantially aligned with at least some of the features. The fluid drop pattern is generated through an optimization process. The fluid drop pattern allows substantially complete filling of imprinting surface features and formation of a substantially uniform residual layer during the imprint lithography process.

  Recently Added Patents
Systems and method for automatic color plane misregistration calibration
Communicating channel state information using predictive vector quantization
Digital video disc player
Target output device and extreme ultraviolet light source apparatus
Method and system for security authentication of radio frequency identification
Entropy encoding and decoding using direct level and run-length/level context-adaptive arithmetic coding/decoding modes
Power management systems and designs
  Randomly Featured Patents
Air assist device of an engine
Storage box for storing of substantially flat articles
Two-dimensional image generator of a moving object and a stationary object
System and method for virtual television program rating
Communication system and its control method, and computer readable memory
Thiazanthenyl semicarbazides
Method for setting well casing using a resin coated particulate
Optical indicator for microscopic laser beam manipulation
Methods and systems to generate and implement a changeover sequence to reconfigure a connection-oriented network
Scanner control system and scanner driver program