Resources Contact Us Home
Drop pattern generation for imprint lithography

Image Number 5 for United States Patent #8119052.

Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement of a multiplicity of drops of substantially equal volume on an imprint lithography substrate such that some of the drops are substantially aligned with at least some of the features. The fluid drop pattern is generated through an optimization process. The fluid drop pattern allows substantially complete filling of imprinting surface features and formation of a substantially uniform residual layer during the imprint lithography process.

  Recently Added Patents
Triazole derivatives as ghrelin analogue ligands of growth hormone secretagogue receptors
Diagnostic data interchange
ESD protection device and method for producing the same
Fixture for camera attachments
Method and system for reduction of decoding complexity in a communication system
Downhole telemetry system
Structural plasticity in spiking neural networks with symmetric dual of an electronic neuron
  Randomly Featured Patents
Semiconductor device provided with an ESD protection circuit
Air conditioner heat-exchanger
Compositions containing anorexigenic compounds and methods for regulating the feed intake of homothermic animals
Luminescent solar collector structure
Method and apparatus for implementing a compact portable computer system
Cellular structure for cartons
Semiconductor device having a fin structure and fabrication method thereof
Antenna for a portable transceiver
Child car
UV-blocking hot melt inks