Resources Contact Us Home
Drop pattern generation for imprint lithography

Image Number 5 for United States Patent #8119052.

Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement of a multiplicity of drops of substantially equal volume on an imprint lithography substrate such that some of the drops are substantially aligned with at least some of the features. The fluid drop pattern is generated through an optimization process. The fluid drop pattern allows substantially complete filling of imprinting surface features and formation of a substantially uniform residual layer during the imprint lithography process.

  Recently Added Patents
Processing biomass
Device for accurately measuring concentration of component in blood and control method of the device
Methods for detecting DNA-binding proteins
Catalyst and process of hydrocarbon feedstock reformation to hydrogen and carbon monoxide
Color image display device, color filter substrate, color pixel array substrate, and electronic device
Direct converting apparatus, method for controlling the same, and control signal generation device
Vehicle headlight
  Randomly Featured Patents
Electric switch having both toggle and rocker functions
Silane coupling agent and method for preparing the same
Method for separating methanol-methyl methacrylate mixtures
Method and an arrangement for disconnecting a heat exchanger charged with a heat vehicle fluid and placed in the path of exhaust gas from an IC engine
Method and circuit for scaling raster images
Self-isolating cross-coupled sense amplifier latch circuit
Flush valve with partial-flush function
Real time signal correlator for high resolution radar
Blousing band for trouser legs