Resources Contact Us Home
Drop pattern generation for imprint lithography

Image Number 10 for United States Patent #8119052.

Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement of a multiplicity of drops of substantially equal volume on an imprint lithography substrate such that some of the drops are substantially aligned with at least some of the features. The fluid drop pattern is generated through an optimization process. The fluid drop pattern allows substantially complete filling of imprinting surface features and formation of a substantially uniform residual layer during the imprint lithography process.

  Recently Added Patents
Load control device
Electronic component mounting machine and operating instruction method for the same
Method and apparatus for executing load distributed printing
Zero-copy network and file offload for web and application servers
Clock face
Authentication service
  Randomly Featured Patents
Detection method of space domain maximum posteriori probability in a wireless communication system
Error correcting programmable pulse generator
Fluorescence image display apparatus
Carbon nanotubes as low voltage field emission sources for particle precipitators
Methods of enclosing a plurality of conductors in a partitioned jacket
Substrate-supported array having steerable nanowires elements use in electron emitting devices
Method for labeling connected components and computer system using the method
Indirect extrusion press
Antisense modulation of PI3 kinase p55 gamma expression
Apparatus for separating a series of objects