Resources Contact Us Home
Drop pattern generation for imprint lithography

Image Number 10 for United States Patent #8119052.

Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement of a multiplicity of drops of substantially equal volume on an imprint lithography substrate such that some of the drops are substantially aligned with at least some of the features. The fluid drop pattern is generated through an optimization process. The fluid drop pattern allows substantially complete filling of imprinting surface features and formation of a substantially uniform residual layer during the imprint lithography process.

  Recently Added Patents
System and method for displaying relationships between electronically stored information to provide classification suggestions via inclusion
Plural component proportioner
Storage basket with lid
Herbicide composition having improved effectiveness, method of preparation and use
Image forming apparatus having a primary transfer unit, a secondary transfer unit, and a direct transfer unit
Systems and related methods of user-guided searching
System and method for agitation of multiple specimen containers
  Randomly Featured Patents
Dual push-cable for pipe inspection
Stiffening structure and stiffening method for automotive outer panel
Optical card reader
Peak detector for resolution enhancement of ultrasonic visualization systems
Molding compounds comprising a mixture of block copolymers employed as a modifier for thermosetting unsaturated polyester resin compositions
Tension measurement system and method
Servo error response system on a magnetic disk device
Furnace roller
Solid electrolytic capacitor and method of manufacturing solid electrolytic capacitor anode material
Process for the preparation of derivative of 7-[(2-hydroxyimino)-acetamido]-cephalosporanic acid