Resources Contact Us Home
Drop pattern generation for imprint lithography

Image Number 10 for United States Patent #8119052.

Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement of a multiplicity of drops of substantially equal volume on an imprint lithography substrate such that some of the drops are substantially aligned with at least some of the features. The fluid drop pattern is generated through an optimization process. The fluid drop pattern allows substantially complete filling of imprinting surface features and formation of a substantially uniform residual layer during the imprint lithography process.

  Recently Added Patents
Nanoparticle entrapment of materials
Valved, microwell cell-culture device and method
Garden tool handle
Display device and method of repairing display device
Malicious attack detection and analysis
Negative active material for a rechargeable lithium battery, a method of preparing the same, and a rechargeable lithium battery comprising the same
Panel for decoration
  Randomly Featured Patents
Chair control
Multiple brand ice beverage dispenser
Computer user interface architecture wherein both content and user interface are composed of documents with links
Nucleic acid molecule encoding a protein growth factor for inhibiting prostate cancer cell growth
Electronic device with cover
Spiroxazine compounds
Connective tissue growth factor-2
Method and apparatus for producing optical flow using multi-spectral images
Self-aligned cobalt silicide on MOS integrated circuits
Device and method for removing vocal signals