Resources Contact Us Home
Semiconductor processing parts having apertures with deposited coatings and methods for forming the same

Image Number 8 for United States Patent #8118941.

Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part and that also divides the holes into one or more other portions. In some embodiments, the aspect ratios of the one or more other portions are about 15:1 or less, or about 7:1 or less, and have a cylindrical or conical cross-sectional shape. The holes are coated with a protective coating, such as a silicon carbide coating, by chemical vapor deposition, including chemical vapor deposition at atmospheric pressure.

  Recently Added Patents
Combination of the application of antibodies for immunostimulation together with glucocorticoids
Process for shaping polymeric articles
Cancer treatment kits comprising therapeutic antibody conjugates that bind to aminophospholipids
Difference detecting apparatus, difference output apparatus, and medium
Method and receiver for jointly decoding received communication signals using maximum likelihood detection
Attribute information providing system
Image forming apparatus and information processing apparatus
  Randomly Featured Patents
Apparatus for glycosyltransferase-catalyzed saccharide synthesis
Capacitance probe for detection of anomalies in non-metallic plastic pipe
Lacrosse handle
Digital scale converter
Method of producing aromatic heterocyclic copolymer and molecular composite material containing same
Bird feeder or similar article
Headlight for beach vehicles
Three dimensional dosimetry using solid array geometry
LED that has bounding silicon-doped regions on either side of a strain release layer
Methods for removing palm heart from palm stalks by coring