Resources Contact Us Home
Semiconductor processing parts having apertures with deposited coatings and methods for forming the same

Image Number 8 for United States Patent #8118941.

Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part and that also divides the holes into one or more other portions. In some embodiments, the aspect ratios of the one or more other portions are about 15:1 or less, or about 7:1 or less, and have a cylindrical or conical cross-sectional shape. The holes are coated with a protective coating, such as a silicon carbide coating, by chemical vapor deposition, including chemical vapor deposition at atmospheric pressure.

  Recently Added Patents
Current collector for lead acid battery
Systems and methods for port mirroring with network-scoped connection-oriented sink
Apparatus and method of preventing signal delay in display device
Apparatus and method for phase synchronization in radio frequency transmitters
Modular utility rack
Electric connection box
Accessing a base station
  Randomly Featured Patents
Universal knowledge information and data storage system
Error correction capability varied with track location on a magnetic or optical disk
Dopant diffusion-retarding barrier region formed within polysilicon gate layer
Bicycle control lever mounting system
Process for determining the fuel consumption or the operating status of combustion engines
Rebounding portable soccer goal and method of use
Smooth unlatch system and method
Process for treating a waste sludge of biological solids
Device and method to locally fill gaps in spotbeam satellite systems with frequency re-use
Magnetic resonance device with a high frequency shield having a high frequency short circuit to the circuits boundary surface of the basic field magnet