Resources Contact Us Home
Semiconductor processing parts having apertures with deposited coatings and methods for forming the same

Image Number 8 for United States Patent #8118941.

Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part and that also divides the holes into one or more other portions. In some embodiments, the aspect ratios of the one or more other portions are about 15:1 or less, or about 7:1 or less, and have a cylindrical or conical cross-sectional shape. The holes are coated with a protective coating, such as a silicon carbide coating, by chemical vapor deposition, including chemical vapor deposition at atmospheric pressure.

  Recently Added Patents
Filler for joint and method for production thereof
Transmission and reception apparatus and method
Position measuring apparatus, position measuring method, image processing apparatus and image processing method
Global investment grade for natural and synthetic gems used in financial investments and commercial trading and method of creating standardized baskets of gems to be used in financial and comm
Techniques for personalizing feed content in virtualized computing environments
Energy efficient transmission in a network
Automatic routing of communications to user endpoints
  Randomly Featured Patents
Telephone handset and cradle
Methyl-6-n-propoxybenzothiazole-2-carbamate and anthelmintic pharmaceutical compositions thereof
Drive apparatus for driving movable member in plastic molding die apparatus
Method and apparatus for non-destructive screening of specimen integrity
Address translation in FFT numerical data processor
Grinding machine, in particular for grinding scissors parts
Plastic container formed by insert-injection process
Aromatic isocyanato-polysulphonic acids
Flash memory device including a dummy cell
Constant current circuit