Resources Contact Us Home
Semiconductor processing parts having apertures with deposited coatings and methods for forming the same

Image Number 8 for United States Patent #8118941.

Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part and that also divides the holes into one or more other portions. In some embodiments, the aspect ratios of the one or more other portions are about 15:1 or less, or about 7:1 or less, and have a cylindrical or conical cross-sectional shape. The holes are coated with a protective coating, such as a silicon carbide coating, by chemical vapor deposition, including chemical vapor deposition at atmospheric pressure.

  Recently Added Patents
Method of making a semiconductor structure useful in making a split gate non-volatile memory cell
Movable body driving apparatus
Double-sided hook push-chip type tubular member clamp
Circumferential stiffener for an aircraft fuselage
Pressure washer wand having a nozzle selector
High discharge capacity lithium battery
Image processing apparatus and method, and program therefor
  Randomly Featured Patents
Method of making and recovering olefin polymer particles
Taphole opening apparatus for blast furnaces
Slow acting phase-locked loop with external control signal
Integrated circuit design tool apparatus and method of designing an integrated circuit
Garbage can
Address information display system and address information display program
RFID-tag structure body, RFID label, and apparatus for producing RFID labels
Process for the conversion of lower aliphatic oxygenates to olefins and aromatics with gallium containing ZSM-5 catalyst
Wireless communication apparatus, wireless communication method and wireless communication media
Constant distance contactless device