Resources Contact Us Home
Semiconductor processing parts having apertures with deposited coatings and methods for forming the same

Image Number 8 for United States Patent #8118941.

Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part and that also divides the holes into one or more other portions. In some embodiments, the aspect ratios of the one or more other portions are about 15:1 or less, or about 7:1 or less, and have a cylindrical or conical cross-sectional shape. The holes are coated with a protective coating, such as a silicon carbide coating, by chemical vapor deposition, including chemical vapor deposition at atmospheric pressure.

  Recently Added Patents
Display unit and display method
Picture information coding device and coding method
Method for counting and segmenting viral particles in an image
Semiconductor IC including pulse generation logic circuit
Polyamide compositions
Blueberry plant named `DrisBlueFour`
Aromatic amine derivative, organic electroluminescent element employing the same, and process for producing aromatic amine derivative
  Randomly Featured Patents
Aluminum nitride from inorganic polymers
Portable outboard motor support and lift
Video bookmarking
Navigation method
Ceramic matrix composite and method of manufacturing the same
System and associated method for determining and transmitting positional data utilizing optical signals
Huffman search algorithm for AAC decoder
Polyester coating compositions comprising cross-linked polymeric microparticles
Wireless communication system, communication device, and communication method
Video game method and apparatus for state-based scrolling