Resources Contact Us Home
Semiconductor processing parts having apertures with deposited coatings and methods for forming the same

Image Number 8 for United States Patent #8118941.

Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part and that also divides the holes into one or more other portions. In some embodiments, the aspect ratios of the one or more other portions are about 15:1 or less, or about 7:1 or less, and have a cylindrical or conical cross-sectional shape. The holes are coated with a protective coating, such as a silicon carbide coating, by chemical vapor deposition, including chemical vapor deposition at atmospheric pressure.

  Recently Added Patents
System and method for providing security in browser-based access to smart cards
Battery cell separator
Control device of hybrid vehicle
Method and apparatus for information exchange over a web based environment
Reception system including a mechanism countering pulsed interference
Transmission device
  Randomly Featured Patents
Method for utilizing properties of the sinc(x) function for phase retrieval on nyquist-under-sampled data
Digital to analog converter with switch function compensation
Mobile phone
Electronic game housing
Automatic output mode select for an actuator controller
Semiconductor module including a semiconductor device, a device mounting board, and a protecting layer therebetween
Bubble dive watch and band
Antilash driving apparatus for rotating a spindle or a work piece receiving member of a machining apparatus
Adjustable multiband antenna and methods
In-line wire drawing machine