Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Semiconductor processing parts having apertures with deposited coatings and methods for forming the same










Image Number 8 for United States Patent #8118941.

Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part and that also divides the holes into one or more other portions. In some embodiments, the aspect ratios of the one or more other portions are about 15:1 or less, or about 7:1 or less, and have a cylindrical or conical cross-sectional shape. The holes are coated with a protective coating, such as a silicon carbide coating, by chemical vapor deposition, including chemical vapor deposition at atmospheric pressure.








 
 
  Recently Added Patents
Communicating channel state information using predictive vector quantization
High sensitivity stress sensor based on hybrid materials
Flexible pouch
Catalyst composition comprising shuttling agent for ethylene multi-block copolymer formation
Basketball
State control of remote hosts for management of distributed applications
Light emitting diode having multi-cell structure and method of manufacturing the same
  Randomly Featured Patents
Canola cultivar DN051607
Hollow golf club with high density weights
Actuator for an aerosol can device
Shoe cover traction pattern with heel and toe areas
Augmented reality maintenance system for multiple rovs
Methods for altering the magnetic properties of materials and the materials produced by these methods
Automatic entertainment caching for impending travel
Device for supplying a flowable medium to the tobacco of a smoking product
Method and apparatus for growing nanotube forests, and generating nanotube structures therefrom
Piston-cylinder-assembly for a coffee brewing apparatus and a method of its operation