Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Semiconductor processing parts having apertures with deposited coatings and methods for forming the same










Image Number 8 for United States Patent #8118941.

Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part and that also divides the holes into one or more other portions. In some embodiments, the aspect ratios of the one or more other portions are about 15:1 or less, or about 7:1 or less, and have a cylindrical or conical cross-sectional shape. The holes are coated with a protective coating, such as a silicon carbide coating, by chemical vapor deposition, including chemical vapor deposition at atmospheric pressure.








 
 
  Recently Added Patents
Image forming apparatus and image forming method
Apparatus and method for recording reboot reason of equipment
Method for using extended security system, extended security system and devices
Mobile communication device
Method and apparatus for optimizing paging in a communication network
One-dimensional metal nanostructures
System and method for selecting a video encoding format based on feedback data
  Randomly Featured Patents
Retractable rotating hose apparatus
Active coherence reduction for interferometer interrogation
Cell necrosis apparatus
Machine for cleaning shoe soles
Tile roof construction obtained using one-component with adhesive pattern
Slender tip laser scalpel
Tape take-away and moistening system
Difraction grating having enhanced blaze performance at two wavelengths
Semiconductor integrated circuits with power reduction mechanism
Thermoplastic polyester compositions containing certain low molecular weight diepoxide resins and having improved impact behavior