Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Semiconductor processing parts having apertures with deposited coatings and methods for forming the same










Image Number 8 for United States Patent #8118941.

Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part and that also divides the holes into one or more other portions. In some embodiments, the aspect ratios of the one or more other portions are about 15:1 or less, or about 7:1 or less, and have a cylindrical or conical cross-sectional shape. The holes are coated with a protective coating, such as a silicon carbide coating, by chemical vapor deposition, including chemical vapor deposition at atmospheric pressure.








 
 
  Recently Added Patents
Method and apparatus for cutting high quality internal features and contours
Stand for food service
Semiconductor device having vertical channel
Intermediate film for laminated glasses, and laminated glass
Post-processing including median filtering of noise suppression gains
Proton conducting electrolytes with cross-linked copolymer additives for use in fuel cells
Puncture resistant fabric
  Randomly Featured Patents
Preparation of esters of 3,5,6-trichlorosalicyclic acid
Inbred corn line LH281
Device for and method of storing and discharging a viscous liquid
System and method for controlling emissions created by spraying liquids from moving vehicles
Entertainment installation
Divot repair tool
Geranium plant named `Neila`
Compact sorter
Etch stop for use in etching of silicon oxide
Boat bumper key float