Resources Contact Us Home
Apparatus for an improved deposition shield in a plasma processing system

Image Number 10 for United States Patent #8117986.

The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.

  Recently Added Patents
Semiconductor overlapped PN structure and manufacturing method thereof
Nucleic acid sequences encoding strictosidine synthase proteins
Systems and methods for picture based communication
Cooking tray
Semiconductor memory device and method for driving the same
Spectral sensor for checking documents of value
Stereoscopic display
  Randomly Featured Patents
Front-axle bracket for motor vehicles
Circuit, apparatus, and method for converting analog signals into digital signals
Rinse water additive
Digital phase shifter apparatus
Dollhouse unit
Process for the extraction of specific transition metals
Charge pump tracking circuit for a phase lock loop
Method for localization of blood clots
Thermal wraps
Writing instrument