Resources Contact Us Home
Apparatus, method and computer program product for fast simulation of manufacturing effects during integrated circuit design

Image Number 2 for United States Patent #8117568.

Methods, apparatus and computer program products provide a fast and accurate model for simulating the effects of chemical mechanical polishing (CMP) steps during fabrication of an integrated circuit by generating a design of an integrated circuit; while generating the design of the integrated circuit, using a simplified model to predict at least one physical characteristic of the integrated circuit which results from a CMP processing step to be used during manufacture of the integrated circuit, wherein the simplified model is derived from simulations performed prior to the design generation activities using a comprehensive simulation program used to model the physical characteristic; predicting performance of the integrated circuit using the predicted physical characteristic; and adjusting the design of the integrated circuit in dependence on the performance prediction.

  Recently Added Patents
Semiconductor device
Adjustable high precision surveying device
Liquid crystal display device
Aperture stop
Semiconductor IC including pulse generation logic circuit
Laser processing method and apparatus
Permanent magnet rotor with flux concentrating pole pieces
  Randomly Featured Patents
Macrocyclic complex modified electrodes and capacitors made therefrom
Releasable handle-type fastener for pipe couplings
Drilling tool, a self-drilling rock bolt, a drill bit, an anchoring device for a self-drilling rock bolt, a shaft for a drilling tool and an end coupling for a drilling tool
Method and device for charging lead accumulators
Methods of fabricating silicon carbide power devices by controlled annealing
Storage router and method for providing virtual local storage
Continuous processes and equipment for treatment of solid substances
Method of preparing an integrated circuit die for imaging
Input data-collating device
Differential with torque distribution